掺磷纳米硅薄膜的微结构

采用喇曼(Raman)散射谱、高分辨率电子显微镜(HRTEM)和原子力显微镜(AFM)对掺磷纳米硅薄膜的微结构进行了分析,并对纳米硅薄膜的传导机制进行了探讨.结果表明:掺磷纳米硅薄膜由尺寸为2～4*#nm的晶粒和2～3个原子层厚的非晶界面构成,计算得到薄膜的晶态比为40%～55%.与本征纳米硅薄膜相比,掺磷纳米硅薄膜晶粒尺寸和晶态比没有明显变化,电导率却提高了2个数量级.随着掺磷浓度增加,纳米硅薄膜的晶粒尺寸、晶态比及电导率逐渐增大.AFM观察表明掺磷纳米硅薄膜由尺寸介于15～20*#nm的团簇构成,团簇排列具有带状特征.     

Preparation,Growth Mechanisms and Characterizations of ZnSe Films via the Solvothermal Method

With diethylamine as a solvent, ZnSe films were formed on the Si substrate directly from zinc and selenium through the modified solvothermal method. The effects of holding temperature, deposition time and substrate surface treatment on the quality and morpholo-gies of the ZnSe films were investigated. The growth mechanism of ZnSe films was proved to be a layer-nucleation growth process, which was tied in with the Stranski-Krastanov (SK) model. ZnSe films were identified by the X-ray diffraction pattern (XRD), the scan-ning electron microscope (SEM), the X-ray photoelectron spectroscope (XPS) and the photoluminescence (PL) techniques. The results indicate that the modified solvothermal method with diethylamine as a solvent is suitable to prepare high quality ZnSe films.     

Study on the Microstructure and Dielectric Properties of Barium Strontium Titanate Thin Films Prepared by Sol-gel Method

Sr05Ba0.5-xBixTiO3 （BST） thin films were fabricated on a Pt/SiO2/Si substrate by the sol-gel method. Then follows an investigation of the influeoces of bismuth （Bi） on the microstructures and the dielectric properties of Sr0.5Ba0.5-xBixTiO3 （BST） thin films. The microstructures of the BST thin films were examined by the XRD and the TEM techniques. Tetragonal perovskite crystal grains were observed in BST thin films. Increasing Bi^3＋ doping ration in BST will lead to decrease of the grain size. It is found that Bi^3＋ doping decreases the dielectric loss and improves the frequency dispersion of the BST thin films. Not only is compressed the peak of temperature-dependence of dielectric constant of Bi^3＋-doped BST thin films but also moves into the low-temperature region. Moreover, the average Curie tem- perature decreases gradually with the Bi^3＋ contents increasing.     

离子镀Ti(N,C)耐磨镀层成分与性能研究

 用空心阴极离子镀技术,在常用的不锈钢(1Cr18Ni9Ti)基材上,镀制Ti(N,C)耐磨镀层。对镀层的成分进行了分析,讨论了镀层成分的耐磨性,显微硬度和附着力的影响。通过对Ti(N,C)镀层与TiN和TiC镀层性能的对比,肯定了Ti(N,C)复合化合物镀层具有更优越的耐磨性和附着力。     

制备工艺对金刚石形核质量的影响

研究了制备工艺对微波等离子体ＣＶＤ金刚石成膜质量的影响。详细讨论了基片在等离子体中的位置、基片台结构、Ｎ２等离子体预处理及启动条件对金刚石成膜均匀性的影响。提出了能获得均匀金刚石膜的制备工艺程序。     

具有纳米结构的 VO_2 相变薄膜

采用无机溶胶－凝胶法制备ＶＯ２相变薄膜，该薄膜相变时的电阻（率）突变可达４～５个数量级。并用ＸＲＤ，ＤＳＣ和ＴＧＡ法研究了制膜过程中干凝胶膜的层状非晶纳米结构。通过适当的非晶晶化过程及随后Ｖ２Ｏ５→ＶＯ２转变的真空热处理，可获得带有空洞（ｖｏｉｄ）结构的低密度纳米薄膜，从而使电阻（率）突变特性异常优异     

BH新型憎水剂及其憎水膜层“三防腐蚀”性能研究

研究了BH系列(BH 102和BH 103)憎水剂的合成工艺、技术指标、憎水处理成膜工艺以及憎水膜层的憎水效果和耐腐蚀性能。结果表明,BH系列憎水剂的憎水效果良好,在零件表面形成的憎水膜层能达到105°以上的憎水角;同时经BH系列憎水剂处理后的钢铁磷化表面的耐腐蚀性能得到明显改善,具有优良的"三防腐蚀"性能,其中含有复配缓蚀剂的BH 103憎水膜层的耐腐蚀性更优于添加单一缓蚀剂的BH 102憎水膜层。     

DLC涂层硬质合金微钻的制备及其切削性能

在硬质合金微型刀具加工高硅铝合金等难加工材料时,通过采用改进的热丝CVD装置开展了DLC涂层硬质合金微钻制备工艺优化,得到了最优沉积工艺,并配合高速加工高硅铝合金(Si15%)材料微小孔钻削性能对比试验,分析了刀具的磨损机理.结果表明:两步预处理方法适合复杂形状硬质合金衬底的预处理方法.钻削高硅铝合金时,DLC涂层具有低摩擦系数和高耐磨损特性,同等切削条件下,涂层微钻的切削寿命比未涂层硬质合金微钻提高了10倍.     

相变光盘多层膜系结构的最佳光匹配研究

论述了相变光盘最佳膜系结构的设计。采用导纳矩阵法计算膜系的能量反射率，用量优化计算方法编程计算，提出了第二大极值解作为在工艺上可行的实用光盘的膜系结构，并按这种膜系结构制作样品，其擦写循环数达１００万次上。     

Fabrication of Diamond-like Carbon Films by Ion Assisted Middle Frequency Unbalanced Magnetron Sputtering

Diamond-like carbon （DLC） films are deposited by the Hall ion source assisted by the mid-frequency unbalanced magnetron sputtering technique. The effects of the substrate voltage bias, the substrate temperature, the Hall discharging current and the argon/nitrogen ratio on the DLC film＇s performance were studied. The experimental results show that the film＇s surface roughness, the hardness and the Young＇s modulus increase firstly and then decrease with the bias voltage incrementally increases. Also when the substrate temperature rises, the surface roughness of the film varies slightly, but its hardness and Young＇s modulus firstly increase followed by a sharp decrease when the temperature surpassing 120 ℃. With the Hall discharging current incrementally rising, the hardness and Young＇s modulus of the film decrease and the surface roughness of the film on 316L stainless steel firstly decreased and then remains constant.