离子注入铜薄一的氧化行为

为克服铜易氧化造成薄膜电阻增加、机械性能下降的缺点,采用离子注入技术对铜薄膜表面进行改性研究。离子注入后进行了氧化试验,并结合Ｘ射线衍射和卢瑟福背散射进行了分析。结果表明,离子注入对原有薄膜的电阻影响是很小的;随注入剂量的增大,抗氧化能力提离;离子注入不但改善了铜薄膜的抗氧化能力,而且氧化行为及氧化层的结构也发生了变化,未经注入的铜薄膜形成的氧化铜以Ｃｕ２Ｏ为主,注入后氧化铜则为Ｃｕ２Ｏ和ＣｕＯ复     

具有纳米结构的 VO_2 相变薄膜

采用无机溶胶－凝胶法制备ＶＯ２相变薄膜，该薄膜相变时的电阻（率）突变可达４～５个数量级。并用ＸＲＤ，ＤＳＣ和ＴＧＡ法研究了制膜过程中干凝胶膜的层状非晶纳米结构。通过适当的非晶晶化过程及随后Ｖ２Ｏ５→ＶＯ２转变的真空热处理，可获得带有空洞（ｖｏｉｄ）结构的低密度纳米薄膜，从而使电阻（率）突变特性异常优异     

溅射NiCrAlY涂层对Ti3Al金属间化合物氧化性能的影响

采用称重法研究了溅射ＮｉＣｒＡｌＹ涂层对Ｔｉ＿３Ａｌ金属间化合物在８５０～９５０℃空气中的氧化性能的影响。结果表明，Ｔｉ＿３Ａｌ的抗氧化性能较差。氧化时，其表面不能形成单一的Ａｌ＿２Ｏ＿３保护膜，氧化膜易剥落；溅射ＮｉＣｒＡｌＹ涂层能通过在涂层表面形成粘附性良好的富Ａｌ＿２Ｏ＿３氧化膜而显著改善Ｔｉ＿３Ａｌ的抗氧化性能。但在９５０℃时有少量合金基体中的Ｔｉ扩散到涂层表面形成ＴｉＯ＿２。同时涂层中的Ｎｉ的强烈向内扩散及基体中的Ｔｉ强烈地向外扩散导致沿涂层与合金基体间形成扩散带。     

GCr15钢离子注入表面改性研究

对航空轴承用钢ＧＣｒ１５进行了硼离子、氮离子及其复合注入试验。利用扫描电镜和Ｘ射线衍射仪对注入层的组织结构进行了分析，并测试了注入层的硬度、耐磨性、耐蚀性。结果表明：ＧＣｒ１５离子注入层形成了多种弥散相和非晶相，表层的残余奥氏体含量也有所减少。表层的硬度、耐磨性以及耐蚀性经离子注入后明显增加。     

注F的MOS电容电高辐射效应研究

对干氧栅氧化后注Ｆ的ＭＯＳ电容进行了γ射线辐照试验，研究了不同注Ｆ剂量的ＭＯＳ电容电离辐射响应特征。结果表明，注Ｆ能抑制辐射感生氧化物电荷和界面态，最佳抑制效果的Ｆ注入剂量范围是５×１０１４～２×１０１６Ｆ／ｃｍ２，且受注Ｆ工艺条件制约，少量或过量的Ｆ注入无明显抑制辐射损伤的能力。推测Ｆ在Ｓｉ／ＳｉＯ２界面和ＳｉＯ２中的行为将直接影响ＭＯＳ器件的辐照性能。而Ｆ的行为依赖于Ｆ的注入工艺条件。用一定模型对实验结果进行了解释。     

C／C复合材料防氧化复合涂层的制备及其性能

提出并制备一种Ｃ／Ｃ复合材料防氧化复合涂层,其基本结构为ＴｉＣ粘结层／ＳｉＣ氧阻挡层／ＺｒＯ２－ＭｏＳｉ２外涂层,研究了其制备工艺、组织结构、对各单一涂层的防氧化作用及效果进行了分析,并对其抗氧化性能进行了测试。通过比较四种成分组成的抗氧化陶瓷外层的抗氧化性能,结果表明：随着外涂层中ＭｏＳｉ２含量的增多,复合涂层的抗氧化性能增强,其中带有ＴｉＣ／ＳｉＣ／ＭｏＳｉ２涂层的Ｃ／Ｃ复合材料试样在１３００     

OCr15Ni5Cu2Ti薄板成形

本文通过对ＯＣｒ１５Ｎｉ５Ｃｕ２Ｔｉ性能特性的分析，给出了该种材料薄板成形工艺的特点，难点。     

碳-碳复合材料Si-MoSi_2涂层的抗氧化性能

研究了Ｓｉ－ＭｏＳｉ２系统作为碳－碳（Ｃ／Ｃ）复合材料抗氧化涂层的可能性。结果表明，当涂层中ＭｏＳｉ２含量为２０（ｗｔ）％时，涂层具有优良的抗氧化和抗热震性能，在１５００℃下，该涂层表现出长寿命抗氧化性能，２４２ｈ的氧化失重为０．５７％，氧化失重速率稳定在２．４３×１０－５ｇ／ｍ２．ｓ。     

C－103铌合金上Si－Cr－Ti料浆熔烧涂层的改性研究

 进行了Ｃ－１０３铌合金上的Ｓｉ－Ｃｒ－Ｔｉ料浆熔烧涂层改性研究,在涂层料浆中添加活性元素锆（Ｚｒ）和惰性氧化物（Ｙ＿２Ｏ＿３）。通过实验,确定了改性方法的工艺参数。改性后的涂层其抗氧化性能有明显提高。利用现代测试技分析了涂层的结构、元素分布、相分布。初步讨论了该涂层的抗氧化机理。     

大气中低温液相过渡连接Al_2O_3陶瓷与WX60钢的研究

用快速凝固合金薄膜作插入金属在大气中低温液相过渡连接Ａｌ＿２Ｏ＿３陶瓷与低合金钢。接头的剪切强度及开焊温度试验结果表明：用快速凝固合金薄膜作插入金属时能明显地提高接头的剪切强度及开焊温度。其中用非晶态Ｃｕ＿（５０）Ｔｉ＿（５０）合金薄膜作插入金属时接头的改性效果最佳，最高剪切强度达７４ＭＰａ，开焊温度为７８０℃。保温时间对接头的强度及开焊温度影响很大，接头的开焊温度随保温时间的延长而明显提高，但对强度而言，保温时间却存在一个最佳范围。     

内氧化制备A1_2O_3/Cu复合材料载流条件下表面磨损形貌和摩擦学性能研究(英文)

Two Al2O3/Cu composites containing 0.24 wt.% Al2O3 and 0.60 wt.% Al2O3 separately are prepared by internal oxidation. Effects of sliding speed and pressure on the frictional characteristics of the composites and copper against brass are investigated and compared. The changes in morphology of the sliding surface and subsurface are examined with scanning electron microscope （SEM） and energy dispersive X-ray spectrum （EDS）. The results show that the wear resistance of the Al2O3/Cu composites is superior to that of copper under the same conditions, Under a given electrical current, the wear rate of Al2O3/Cu composites decreases as the Al2O3-content increases, However, the wear rates of the Al2O3/Cu composites and copper increase as the sliding speed and pressure increase under dry sliding condition. The main wear mechanisms for Al2O3/Cu composites are of abrasion and adhesion; for copper, it is adhesion, although wear by oxidation and electrical erosion can also be observed as the speed and pressure rise.     

多弧离子镀Cr/Cr2O3薄膜红外及可见光谱特性

采用多弧离子镀制备了具有不同色彩的Cr/Cr2O3薄膜,利用紫外-可见光分光光度计研究了薄膜在可见和红外波段的光谱特性,利用SEM进行薄膜表面结构和形貌的分析,利用四探针测阻仪测试了样品的方块电阻,利用红外发射率测量仪测试了样品的红外发射率。结果表明:Cr/Cr2O3薄膜具有丰富的色彩,在可见光区有明显的反射峰,可见光区光谱特性主要受膜厚的影响,方块电阻随膜厚增加而有变大,样品的红外发射率主要取决于金属层,平均红外发射率最小降至0.371。     

SiO2溶胶在电沉积法制备CuInS2薄膜中的作用

 针对目前电沉积法制备的CuInS2(CIS)薄膜存在S元素含量不足以及微观形貌差的问题,通过在普通镀液中加入SiO2溶胶,采用一步电沉积技术在ITO导电玻璃上制备Cu In S预制薄膜,镀液的主要组成为金属盐、硫代硫酸钠和不同浓度SiO2溶胶。在空气气氛中对Cu In S预制薄膜进行退火处理以获得多晶的CIS薄膜,并通过X射线衍射（XRD）、扫描电镜（SEM）、能量色散谱仪（EDS）及开路电位对CIS薄膜的结构、形貌、成分组成及光响应性能进行研究。结果表明：SiO2溶胶浓度为4 mL/L时,得到的CIS薄膜的结晶度提高,同时,SiO2溶胶作用下得到的CIS薄膜的表面形貌、成分组成和光响应性能都得到改善。因此,镀液中加入SiO2溶胶有利于提高CIS薄膜的性能,尤其是浓度为4 mL/L时,性能提高得最为明显。     

离子注入改善电接触微动磨损研究

以AgCu10合金为对象, 研究和探讨了离子注入提高电接触材料的抗氧化和抗磨损性能并改善电接触微动磨损的技术. 试验结果表明,离子注入后的AgCu10合金大大减少了磨损颗粒的产生,降低了磨损过程中产生的金属转移, 减轻了磨损颗粒的氧化污染, 从而提高合金表面耐磨损和抗腐蚀性能, 改善电接触微动磨损性能.     

离子注入提高铜合金耐磨性的初步研究

 本文对ZQSn10-2-3锡青铜表面状态为镀银和未镀银的两种样品,分别采用N₂⁺离子注入及（Ag+N₂⁺）离子束混合技术,进行表面改性,提高其耐磨性。并且用背散射装置、离子探针和扫描电镜对离子注入层进行了测试与分析。试验结果表明,离子注入及离子束混合样品,抗磨损能刀明显提高。     

IBAD法沉积TiN薄膜的机械和耐腐性

用离子束辅助沉积(IBAD)方法在医用不锈钢317L基底上沉积TiN陶瓷薄膜。通过X射线衍射(XRD)和俄歇电子能谱(AES)分析研究了薄膜的微结构；测试了薄膜的耐磨性及薄膜与基底的附着力：运用电化学腐蚀的方法检测了薄膜在Hank’s模拟体液中的耐腐蚀性能。研究结果表明：用高、低能氮离子束兼用的IBAD方法沉积TiN多晶薄膜后，材料表面结构和性能发生明显改变。表面硬度和耐磨性有明显提高，在Hank’s模拟体液中显示出更强的抗腐蚀能力。     

High Temperature Flow Stress Prediction of Nano-Al_2O_3/Cu Composite Using an Artificial Neural Network

Alumina dispersion strengthened copper composite (nano-Al2O3/Cu composite) was recently emerged as a kind of potentially vi-able and attractive engineering material for applications requiring high strength, high thermal and electrical conductivities and resistance to softening at elevated temperatures. The nano-Al2O3/Cu composite was produced by internal oxidation. The microstructures of the composite were analyzed by the TEM and its hot deformation behavior was investigated by means of continuous compression tests per-formed on a Gleeble 1500 thermo-simulator. Making use of the modified algorithm–Levenberg-Marquardt (L-M) algorithm BP neural network, a model for predicting the flow stresses during hot deformation was set up on the base of the experimental data. Results show that the microstructures of the composite are characterized by uniform distribution of nano-Al2O3 particles in Cu-matrix. The sliding of dislocations is the main deformation mechanism. The dynamic recovery is the main softening mode with the flow stress decreasing gen-tly from 500 ℃ to 850 ℃. The recrystallization of Cu-matrix can be retarded late into as high as 850 ℃, when it happens only partially. The well-trained BP neural network model can accurately describe the influence of the temperature, strain rate, and true strain on the flow stresses, therefore, it can precisely predict the flow stresses of the composite under given deforming conditions and provide a new way to optimize hot deforming process parameters.     

Morphology and Frictional Characteristics Under Electrical Currents of Al203/Cu Composites Prepared by Internal Oxidation

Two AhO3/Cu composites containing 0.24 wt.% A1203 and 0.60 wt.% A1203 separately are prepared by internal oxidation.Effectsof sliding speed and pressure on the fi-ictional characteristics of the composites and copper against brass are investigated and compared.The changes in morphology of the sliding surface and subsurface are examined with scanning electron microscope (SEM) and energy dispersive X-ray spectrum (EDS).The results show that the wear resistance of the AI203/Cu composites is superior to that of copperunder the same conditions.Under a given electrical current,the wear rate of AI203/Cu composites decreases as the AleO3-content increases.However,the wear rates of the Al203/Cu composites and copper increase as the sliding speed and pressure increase under drysliding condition.The main wear mechanisms for AleO3/Cu composites are of abrasion and adhesion;for copper,it is adhesion,although wear by oxidation and electrical erosion can also be observed as the speed and pressure rise.     

2198和5A90铝锂合金脉冲阳极氧化膜制备及耐蚀性

在18%(质量分数,下同)H_2SO_4+5%C_2H_2O_4水溶液中,采用脉冲(PC)电流对2198和5A90两种铝锂合金进行阳极氧化处理。用扫描电子显微镜(SEM)观察铝锂合金阳极氧化膜表面和截面形貌;用能谱仪(EDS)对其成分进行面扫描和线扫描;用动电位极曲线检测氧化膜在3.5%NaCl水溶液中的耐蚀性。结果表明:2198和5A90铝锂合金阳极氧化膜主要由Al的氧化物组成;2198合金氧化膜表面存在细小颗粒,厚度约为150μm;5A90合金氧化膜表面存在微孔,为后续封孔处理提供结构条件,厚度约为180μm;用脉冲方法在两种铝锂合金表面生成的较厚阳极氧化膜具有较高的耐蚀性。     

Preparation and Microstructure of Highly-Oriented LaNiO_3 Thin Films by RF Sputtering Method

In an attempt of being used as buffer layers and electrodes for the textured BaTiO3 (BTO) ferroelectric thin films, highly (100)-oriented LaNiO3 (LNO) thin films of different thicknesses were deposited directly on Si (100) substrate with radio-frequency (RF) magnetron sputtering method. It is observed that the substrate temperatures and the film thicknesses bring main influences on the micro-structures and orientation of the thin film. The effects of the thicknesses and substrate temperatures on the orientation of the films were studied on the LNO films of different thicknesses. The highly (100)-oriented LNO thin films were obtained at the substrate temperature of 600 ℃. The existence of epitaxially grown BTO films indicates that the oriented LNO thin films obtained in this work could be used as a buffer layer for epitaxial growth.