磁控管电机恒流驱动研究

捷变频磁控管采用音圈电机驱动方案,驱动磁控管高频直线振动,实现其大范围捷变带宽和快速捷变的功能.文章分析了磁控电机驱动特性和磁控管捷变带宽变化的原因,确定影响磁控管的捷变带宽稳定性的主要因素.介绍了磁控电机电路温度补偿和恒流驱动方案,并进行了试验验证,提高了磁控电机驱动稳定性,从而稳定了磁控管捷变带宽.     

捷变频磁控管用高频直线振荡电机设计

捷变频磁控管的快速捷变特性取决于驱动电机的性能,要求电机功耗小、体积小、效率高,能实现高频稳幅直线振动.文章介绍了音圈直线电机、电磁开关式直线电机和电磁混合式直线电机等三种方案,通过对其工作原理和性能特点分析,确定了音圈直线电机驱动方案,进行了电磁场仿真分析和电磁参数设计,进行了样机试验测试.结果表明,设计的音圈直线电...     

Fabrication of Diamond-like Carbon Films by Ion Assisted Middle Frequency Unbalanced Magnetron Sputtering

Diamond-like carbon （DLC） films are deposited by the Hall ion source assisted by the mid-frequency unbalanced magnetron sputtering technique. The effects of the substrate voltage bias, the substrate temperature, the Hall discharging current and the argon/nitrogen ratio on the DLC film＇s performance were studied. The experimental results show that the film＇s surface roughness, the hardness and the Young＇s modulus increase firstly and then decrease with the bias voltage incrementally increases. Also when the substrate temperature rises, the surface roughness of the film varies slightly, but its hardness and Young＇s modulus firstly increase followed by a sharp decrease when the temperature surpassing 120 ℃. With the Hall discharging current incrementally rising, the hardness and Young＇s modulus of the film decrease and the surface roughness of the film on 316L stainless steel firstly decreased and then remains constant.     

Microstructure and Optical Characterization of Magnetron Sputtered NbN Thin Films

Some fundamental studies on the preparation, structure and optical properties of NbN films were carried out. NbN thin films were deposited by DC reactive magnetron sputtering at different N2 partial pressures and different substrate temperatures ranging from –50 ℃ to 600 ℃. X-ray diffraction analysis (XRD) and scanning electron microscopy (SEM) were employed to characterize their phase com- ponents, microstructures, grain sizes and surface morphology. Optical properties inclusive of refractive indexes, extinction coefficients and transmittance of the NbN films under different sputtering conditions were measured. With the increase in the N2 partial pressure, δ-NbN phase structure gets forming and the grain size and lattice constant of the cubic NbN increasing. The deposited NbN film has relatively high values of refractive index and extinction coefficient in the wavelength ranging from 240 nm to 830 nm. Substrate tem- perature exerts notable influences on the microstructure and optical transmittance of the NbN films. The grain sizes of the δ-NbN film remarkably increase with the rise of the substrate temperature, while the transmittance of the films with the same thickness decreases. Ultra-fine granular film with particle size of several nanometers forms when the substrate is cooled to –50 ℃, and a remarkable aug- mentation of transmittance could be noticed under so low a temperature.     

磁控溅射沉积工艺条件对薄膜厚度均匀性的影响

薄膜厚度均匀性是衡量薄膜质量和镀膜装置性能的一项重要指标.在自行设计的磁控溅射沉积设备上,对薄膜沉积工艺中靶基间距、溅射功率、工作气压对膜厚均匀性的影响进行了研究,由连续光谱椭圆偏光仪SE800测量薄膜厚度.结果表明:靶基间距较大的情况下,薄膜均匀性明显改善;溅射功率和工作气压对薄膜均匀性也有较大的影响.     

Silver Film Growth on Glass Ceramic by Radio Frequency Magnetron Sputtering

Thin silver films are deposited by radio frequency magnetron sputtering on glass ceramic at room temperature.Variations of sputtering power,bios voltage and power density are carried out for each deposition,then parts of as-deposited samples are subjected to annealing at 600 ℃ within a vacuum chamber.Structural properties are studied by X-ray diffraction(XRD),scanning electron microscope(SEM)and laser scanning confocal microscope(LSCM).It is shown that structural properties have a strong dependency on sputtering power and annealing temperature.Electrical contact resistance measured by a four point probe instrument is directly affected by the thickness of films.It is also found that the film conductivity,especially in thinner films,is improved by the increasing grain size.Finally,the film adhesion is observed by scratch tests.And the adhesive ability deposited by radio frequency magnetron sputtering shows a better performance than that produced by traditional methods.     

全固态薄膜锂电池研究进展和产业化展望

全固态薄膜锂电池利用固态电解质替代传统电解液,采用多层薄膜堆垛的平面结构,属于新一代的锂离子电池,在军民两用的可穿戴设备、便携式移动电源、汽车和航空动力电池等领域应用前景广阔。该类电池因高安全性、长循环寿命、高比容量和高能量密度等优势性能受到业界广泛关注。本文概述薄膜锂电池的分类和充放电原理,总结正负极、电解质薄膜材料的发展历程和薄膜制备手段的改进,对比各类电池材料的电化学性能,引入该方向最新的研究进展:三维薄膜锂电池,可变形的柔性电池,高电压、大容量电池组。汇总国外商用电池产品、关键优势技术、电池制备设备,提出薄膜锂电池亟待解决的科学问题和国内潜在的产业化方向。     

磁性多层膜微波吸收剂的制备

利用磁控溅射设备制备了Fe／SiO2磁性多层膜微波吸收剂。采用扫描电子显微镜(SEM),X射线衍射仪(XRD)对其结构进行表征。将磁性多层膜微波吸收剂制成同轴测试样品,利用网络矢量分析仪测量电磁参数,并针对单层材料进行优化设计。结果表明,该磁性多层膜吸收剂具有较好的微波吸收效果。     

射频磁控溅射沉积热障涂层结构特征及高温氧化性能

采用3kW射频电源在经真空电弧镀涂敷了NiCrAlY过渡层的涡轮和导向叶片上沉积 ZrO2陶瓷层,对其组织结构与元素面分布进行了电子探针测试.对NiCrAlY涂层进行喷丸形变处理,研究了不同时效温度下的应力变化.测试了热障涂层高温氧化与热冲击性能,结果表明,经1100℃静态氧化100h和热冲击500次陶瓷层未剥落.     

CrON扩散阻挡层对NbCrAl涂层与Nb基高温合金元素互扩散的影响

利用磁控溅射技术在C103型Nb基高温合金上制备了含和不含CrON扩散阻挡层的NbCrAl涂层,对比研究了2种涂层分别经900℃和1000℃真空热处理后的元素扩散行为。结果表明:NbCrAl涂层以Cr₂Nb和AlNb₂相为主,含非晶态组织;真空热处理后生成了NbAl₃和(Nb,Cr)沉淀相。热处理温度由900℃升至1000℃时,NbCrAl涂层中元素扩散速度加快。不含扩散阻挡层样品中Cr和Al元素扩散至基体的含量分别为2.76wt%和1.21wt%,而含扩散阻挡层样品中Cr和Al元素扩散到基体的含量分别仅为2.52wt%和0.84wt%。扩散阻挡层保持连续,且与涂层及基体的界面结合良好,经高温处理后主要以密排六方结构的Cr₂O₃和Al₂O₃相为主,有效地抑制了元素互扩散。