Solid nanomembrane manufacture using ion-plasma action

A process of manufacture of porous membranes made of aluminum foil (Al 99.99%) by the method of electrochemical anodic oxidation followed by a continuous barrier layer removal with ion-plasma irradiation is described. The membranes having a 8 mm diameter made from AL2O3 with a thickness from 2 to 5 microns thick with a regular channel arrangement are obtained. A possibility to change the channel diameter in the range of 20?C100 nm by adjusting voltage and temperature during the oxidation is shown. We present the experimental dependencies of aluminum and aluminum oxide sputtering coefficients on the energy and incidence angle of xenon ions within the energy range of 100??400 eV.