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C/SiC复合材料烧蚀机理和通用计算模型研究
引用本文:国义军,桂业伟,童福林,代光月,曾磊.C/SiC复合材料烧蚀机理和通用计算模型研究[J].空气动力学学报,2012,30(1):34-38.
作者姓名:国义军  桂业伟  童福林  代光月  曾磊
作者单位:中国空气动力研究与发展中心,四川绵阳,621000
摘    要:研究了C/SiC复合材料氧化烧蚀机理,发现它们与传统的硅基和碳基材料烧蚀有很大差别。C/SiC的烧蚀取决于氧的分压、表面温度和材料晶态结构及成份,可能出现活性氧化和惰性氧化两种破坏机制。研究了氧化膜的形成和破坏条件,以及氧化膜中氧气的扩散机制,建立了适用于C、Si、SiC和C/SiC(C和SiC可有不同混和比)四种材料烧蚀计算的通用物理数学模型。

关 键 词:C/SiC  烧蚀  氧化膜  计算模型

Thermochemical ablation mechanisms and general relationship for C/SiC material oxidation
GUO Yi-jun , GUI Ye-wei , TONG Fu-lin , DAI Guang-yue , ZENG Lei.Thermochemical ablation mechanisms and general relationship for C/SiC material oxidation[J].Acta Aerodynamica Sinica,2012,30(1):34-38.
Authors:GUO Yi-jun  GUI Ye-wei  TONG Fu-lin  DAI Guang-yue  ZENG Lei
Institution:(China Aerodynamics Research and Development Center,Mianyang Sichuan 621000,China)
Abstract:The oxidation mechanism of C/SiC composite material were examined in detail.The C/SiC material exhibit two types of oxidation behaviour: active and passive oxidation at high temperature depending on ambient oxygen partial pressures and mass fractions of C and SiC in the C/SiC composite material.The silicon based material has good oxidation resistance due to the formation of a protective silica scale.The conditions under which the protective scale forms and decrease,diffusion of oxygen in the scales,and the growth rates of the scales were investigated thoroughly.General relationships for active and passive oxidation as well as transition between them were derived.
Keywords:C/SiC  ablation  silica scales  calculation model
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