| 射频磁控溅射Cr/CrN膜微结构和力学性能研究 |
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| 引用本文： | 李立,刘峰,柴立全,王娟,孟月冬,任兆杏.射频磁控溅射Cr/CrN膜微结构和力学性能研究[J].中国民航学院学报,2006,24(5):56-59. |
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| 作者姓名： | 李立 刘峰 柴立全 王娟 孟月冬 任兆杏 |
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| 作者单位： | [1]中国民航大学理学院,天津300300 [2]中国民航大学基础实验中心,天津300300 [3]中国科学院等离子体物理研究所,合肥230031 |
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| 基金项目： | 中国民航大学校科研和教改项目 |
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| 摘 要： | 利用射频磁控溅射制备了Cr／CrN多层薄膜，并对比单层CrN薄膜，分析研究了多层膜周期与结构和性能之间的关系。研究结果表明：多层膜中没有出现柱状晶体结构，而且结晶取向与单层CrN有显著区别；多层膜的应力普遍小于单层CrN，硬度略高于或接近于单层CrN，在外力作用下的抗变形能力远高于单层CrN；多层膜的应力和硬度随周期厚度的减小而增大，在周期15nm时硬度值达到最大23、8GPa，表明Cr／CrN多层膜的硬度与周期结果有关，而且存在使薄膜性能达到最佳的周期值。
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| 关 键 词： | 射频磁控溅射 Cr/CrN多层薄膜 微结构 纳米硬度 内应力 |
| 文章编号： | 1001-5000(2006)05-0056-04 |
| 收稿时间： | 2006-05-24 |
| 修稿时间： | 2006-07-07 |
Study on Microstructure and Mechanical Properties of Cr/CrN Multilayered Films Prepared by RF Magnetron Sputtering |
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| LI Li,LIU Feng,CHAI Li-quan,WANG Juan,MENG Yue-dong,REN Zhao-xing.Study on Microstructure and Mechanical Properties of Cr/CrN Multilayered Films Prepared by RF Magnetron Sputtering[J].Journal of Civil Aviation University of China,2006,24(5):56-59. |
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| Authors: | LI Li LIU Feng CHAI Li-quan WANG Juan MENG Yue-dong REN Zhao-xing |
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| Institution: | 1a.Science College ; 1 b,Basic Experiment Center, CA UC, Tianjin 300300, China; 2, Institute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031, China |
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| Abstract: | The CdCrN nanoseale multiplayered films have been synthesized by radio-frequency reactive magnetron sputtering. The columnar grain growth in CrN film can not be observed in Cr/CrN muhilayers,and the crystalline orientation of the multilayers is different from CrN film. The residual stress of the multilayers is lower than that of CrN,and hardness is higher than or close to CrN,and the resistant to deformation caused by force is much better than CrN. The hardness and stress of muhilayers increase with the modulation period decreasing. The hardness of muhilayers reaches the top of 23.8 GPa at A=15 nm,which indicates that the hardness is influenced by the modulation period and there is optimal modulation period to improve the hardness of Cr/CrN muhilayers. |
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| Keywords: | RF magnetron sputtering Cr/CrN muhilayers microstructure nano-hardness stress |
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