| 光干涉技术在纳米精度测量中的应用及发展 |
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| 引用本文： | 黎永前,朱名铨. 光干涉技术在纳米精度测量中的应用及发展[J]. 航空精密制造技术, 2002, 38(2): 32-36 |
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| 作者姓名： | 黎永前 朱名铨 |
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| 作者单位： | 西北工业大学飞行器制造工程系,西安,710072;西北工业大学飞行器制造工程系,西安,710072 |
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| 摘 要： | 分析了几种应用于纳米精度测量的光干涉技术工作原理、应用限制及研究现状,包括X射线干涉仪、干涉仪及激光外差干涉技术。
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| 关 键 词： | 纳米精度测量 激光干涉 校准技术 |
| 文章编号： | 1003-5451(2002)02-32-05 |
| 修稿时间： | 2001-10-29 |
Optical Interferometry Technology and its Development in Nanometric Accuracy Measurement |
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| Li Yongqian,Zhu Mingquan. Optical Interferometry Technology and its Development in Nanometric Accuracy Measurement[J]. Aviation Precision Manufacturing Technology, 2002, 38(2): 32-36 |
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| Authors: | Li Yongqian Zhu Mingquan |
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| Abstract: | The principle of optical interferometry technologies, X ray interferometer, Fabry Perot interferometry and heterodyne laser interferometry in nanometric accuracy measurement and calibration are introduced. Their application range and development are described. |
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| Keywords: | nanometric accuracy measurement laser interferometry calibration technology |
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