石英半球谐振子力流变抛光

为提升石英半球谐振子抛光加工的效率及表面质量，对其内外表面进行了力流变抛光实验。利用力流变抛光液的剪切增稠特性，使流变流体柔性把持游离磨粒与工件表面相对运动实现材料去除，通过控制抛光液流场及界面剪切应力实现半球谐振子内外表面柔性、高效抛光。实验过程石英半球谐振子外表面采用浸入式抛光方法，抛光30 min表面粗糙度Ra从135.5 nm降至6.6 nm，内表面采用切入式抛光方法，抛光15 h表面粗糙度Ra从128.2 nm降至9 nm。实验结果证明了力流变抛光方法在石英半球谐振子抛光领域的应用潜力。

Shear Rheological Polishing of Quartz Hemispheric Resonator

Shear Rheological Polishing (SRP) experiments were carried out on the internal and external surfaces of Quartz Hemispheric Resonator (QHR) to improve the polishing efficiency and surface quality. Based on the shear thickening effect, the rheological fluid can flexibly control the free abrasive particles and move relative to the workpiece surface to achieve material removal. By controlling the flow field of polishing fluid and the interfacial shear stress field, the internal and external surfaces of the QHR can be polished flexibly and efficiently. Experimental results show that the surface roughness of external surface of the QHR decrease from 135.5 nm to 6.6 nm by using an immersion polishing method for 30 min, and the surface roughness of the internal surface decrease from 128.2 nm to 9 nm by using a plunge polishing method for 15 h. The experimental results demonstrate the potential of SRP in the field of QRH polishing.