| 铝的碱性化学抛光光亮剂作用的机理研究 |
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| 引用本文： | 于维平,苗艺.铝的碱性化学抛光光亮剂作用的机理研究[J].北京航空航天大学学报,1990(4):40-45. |
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| 作者姓名： | 于维平 苗艺 |
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| 作者单位： | 北京航空航天大学材料科学与工程系
(于维平，苗艺)，北京航空航天大学材料科学与工程系(张凌云) |
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| 摘 要： | 用充电曲线——拉普拉斯变换方法获得了抛光液中不同成份在80℃,90℃下的交流阻抗频谱图,配合失重腐蚀速度数据,研究了光亮剂对双电层结构的影响。揭示了在抛光过程中光亮剂通过吸附、沉积、扩散步骤达到试样表面整平、光亮效果。
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| 关 键 词： | 化学抛光 光亮剂 铝 交流阻抗 |
MECHANISM OF THE BRIGHT AGENT IN ALKALINE CHEMICAL POLISHING OF ALUMINUM |
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| Yu Weiping Miao Yi Zhang Lingyun.MECHANISM OF THE BRIGHT AGENT IN ALKALINE CHEMICAL POLISHING OF ALUMINUM[J].Journal of Beijing University of Aeronautics and Astronautics,1990(4):40-45. |
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| Authors: | Yu Weiping Miao Yi Zhang Lingyun |
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| Institution: | The Department of Material Science and Engineering |
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| Abstract: | Alternating Current Impedence diagrams were obtained by Current-step and Laplace transformation in alkaline chemical polishing of aluminum.The datum of corrosive weight loss was also obtained.The influence of bright agent on the structure of electrod was researched.It was proposed that the brighten effect was get by the absorbability,depostion and diffusion of bright agent. |
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| Keywords: | chemical polishing bright agent alternating current impedance |
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