Effect of Microaccelerations on the Distribution of a Dopant in a Semiconductor Melt during Space Flight |
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Authors: | S A Nikitin V I Polezhaev V V Sazonov |
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Institution: | (1) Russian Academy of Sciences, Institute for Problems of Mechanics, pr. Vernadskogo 101, Moscow, 117526, Russia;(2) Russian Academy of Sciences, Keldysh Institute of Applied Mathematics, Miusskaya pl. 4, Moscow, 125047, Russia |
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Abstract: | The effect of residual microaccelerations on the distribution of a dopant in a semiconductor melt located in a heated closed cavity onboard an Earth-orbiting satellite is considered in the context of a model problem of thermal convection. The amplitude–frequency characteristics of the response of this distribution to the perturbing microaccelerations are obtained. It is demonstrated that the effect of low-frequency microaccelerations decreases when the frequency increases. A comparison is made of the macroscopic inhomogeneities of the dopant concentration due to the actual low-frequency (quasi-static) component of microaccelerations onboard different spacecraft: the orbital station Mir, the satellite Foton-11, a Space Shuttle orbiter, and the International Space Station. A substantial effect of the rotational motion of the spacecraft on the character of the time behavior of a macroscopic inhomogeneity is demonstrated. |
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