| 硅液相外延生长的晶向自动偏离现象 |
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| 引用本文： | 江鉴 张仕国. 硅液相外延生长的晶向自动偏离现象[J]. 上海航天, 1999, 0(1): 27-29 |
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| 作者姓名： | 江鉴 张仕国 |
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| 作者单位： | 上海航天技术研究院８０９所(江鉴)，浙江大学硅材料科学国家重点实验室(张仕国) |
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| 基金项目： | 浙江省自然科学基金,高教博士点资金 |
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| 摘 要： | 通过对液相外延的薄膜Ｘ衍射测试，结果显示不论衬底是否偏离［１１１］晶向，外延层在同一衍射位置都出现了双峰。经比较分析，确认了硅（１１１）面在液相外延生长时存在晶向自动偏转现象。
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| 关 键 词： | 薄膜工艺 液相外延 X衍射 晶体生长 |
THE AUTOMATIC DEFLECTION OF CRYSTAL ORIENTATION IN Si LIQUID PHASE EPITAXY |
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| Jiang Jian. THE AUTOMATIC DEFLECTION OF CRYSTAL ORIENTATION IN Si LIQUID PHASE EPITAXY[J]. Aerospace Shanghai, 1999, 0(1): 27-29 |
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| Authors: | Jiang Jian |
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| Abstract: | This research studied the X ray diffraction of the Si liquid phase layers on substrates and that deflecting from crystal orientation, the diffraction showed that the results are alike. Through this experiment, it is thought that the epi layer crystal orientation will deflect during the liquid phase epitaxy on Si substrate. |
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| Keywords: | Thin film technology Liquid phase epitaxy X ray diffraction Crystal growth |
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