| 特种材料表面镀TiN薄膜的结构与应力研究 |
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| 引用本文： | 崔砚. 特种材料表面镀TiN薄膜的结构与应力研究[J]. 导航与控制, 2010, 0(2): 67-71 |
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| 作者姓名： | 崔砚 |
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| 作者单位： | 北京航天控制仪器研究所 |
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| 摘 要： | 本文采用多弧离子镀技术在特种材料表面制备TiN薄膜。利用扫描电镜和X射线衍射仪对TiN薄膜的形貌、成分结构、残余应力进行研究，结果表明：薄膜表面粗糙度较大；薄膜由TiN单相组成，以（111）晶面为主；TiN薄膜存在较大残余压应力，经过保温热处理后，薄膜的残余应力显著下降。
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| 关 键 词： | 多弧离子镀；TiN薄膜；热处理；残余应力 |
Research on Structure and Residual Stress of TiN Films Deposited on Particular Substrate |
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| CUI Yan. Research on Structure and Residual Stress of TiN Films Deposited on Particular Substrate[J]. Navigation and Control, 2010, 0(2): 67-71 |
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| Authors: | CUI Yan |
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| Affiliation: | Beijing Institute of Aerospace Control Device |
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| Abstract: | TiN films deposited on particular substrate using Multi-Arc ion plating system was introduced in this paper. The structure and residual stress of TiN films were analysed by SEM and X-ray diffraction (XRD). The results showed that the phase of TiN films prepared were single TiN and most of the orientation of TiN films was (111); great residual stress exsits in TiN films prepared by Multi-Arc ion plating system and residual stress of TiN films decreases after heat treatment. |
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