纯钛及其合金表面纳米多孔TiO2膜的制备研究

在含有HF酸和C rO3的电解液中,恒压直流阳极氧化法可以在TA 1和TC 4表面分别制备获得纳米多孔T iO2膜。各阳极氧化参数对于纳米多孔膜的宏观形貌、微观结构等都有着重要的影响。随着阳极氧化电压的增高,纳米多孔T iO2膜的平均孔径值和氧化膜厚度也随之增大;随着氧化时间的延长,氧化膜的厚度在一定范围内不断增厚,当达到极限值后保持不变;在较高电压下,随着氧化时间的延长,纳米多孔T iO2膜的平均孔径值明显增大;在较低电压下,随着氧化时间的延长,纳米多孔T iO2膜的平均孔径值没有明显的变化。试验表明纳米多孔T iO2膜的生长过程强烈依赖于电场支持下电解液对钛基体的溶解过程(即场致溶解过程)。

Fabrication of Nano-Porous TiO2 Films on Pure Titanium and Its Alloy

Nano-porous anodic films are fabricated by the anodic oxidation of TA1 and TC4 with the invariable anodizing voltage on HF and CrO_3 electrolyte.Anodizing parameters have an important influence on the morphological characters of nano-porous TiO_2 films.The effect of anodizing parameters(anodizing voltage,anodizing time) on the morphological characters of nano-porous TiO_2 films is investigated.The average diameters of nano-holes on nano-porous TiO_2films and the thickness of the anodic films become bigger when the anodizing voltage increases.The thickness of anodic films has same trend with the increasing of the anodizing time.The average diameters of nano-holes increases evidently with anodizing time increasing on higher anodizing voltage,but it is not obvious on lower anodizing voltage.Therefore,it is concluded that the growth of nano-porous anodic films is strongly relied on the dissolution process on the substrates in the electrical field(field-enhanced dissolution).