磁控溅射沉积工艺条件对薄膜厚度均匀性的影响

薄膜厚度均匀性是衡量薄膜质量和镀膜装置性能的一项重要指标.在自行设计的磁控溅射沉积设备上,对薄膜沉积工艺中靶基间距、溅射功率、工作气压对膜厚均匀性的影响进行了研究,由连续光谱椭圆偏光仪SE800测量薄膜厚度.结果表明:靶基间距较大的情况下,薄膜均匀性明显改善;溅射功率和工作气压对薄膜均匀性也有较大的影响.     

Microstructure and Optical Characterization of Magnetron Sputtered NbN Thin Films

Some fundamental studies on the preparation, structure and optical properties of NbN films were carried out. NbN thin films were deposited by DC reactive magnetron sputtering at different N2 partial pressures and different substrate temperatures ranging from –50 ℃ to 600 ℃. X-ray diffraction analysis (XRD) and scanning electron microscopy (SEM) were employed to characterize their phase com- ponents, microstructures, grain sizes and surface morphology. Optical properties inclusive of refractive indexes, extinction coefficients and transmittance of the NbN films under different sputtering conditions were measured. With the increase in the N2 partial pressure, δ-NbN phase structure gets forming and the grain size and lattice constant of the cubic NbN increasing. The deposited NbN film has relatively high values of refractive index and extinction coefficient in the wavelength ranging from 240 nm to 830 nm. Substrate tem- perature exerts notable influences on the microstructure and optical transmittance of the NbN films. The grain sizes of the δ-NbN film remarkably increase with the rise of the substrate temperature, while the transmittance of the films with the same thickness decreases. Ultra-fine granular film with particle size of several nanometers forms when the substrate is cooled to –50 ℃, and a remarkable aug- mentation of transmittance could be noticed under so low a temperature.     

Fabrication of Diamond-like Carbon Films by Ion Assisted Middle Frequency Unbalanced Magnetron Sputtering

Diamond-like carbon （DLC） films are deposited by the Hall ion source assisted by the mid-frequency unbalanced magnetron sputtering technique. The effects of the substrate voltage bias, the substrate temperature, the Hall discharging current and the argon/nitrogen ratio on the DLC film＇s performance were studied. The experimental results show that the film＇s surface roughness, the hardness and the Young＇s modulus increase firstly and then decrease with the bias voltage incrementally increases. Also when the substrate temperature rises, the surface roughness of the film varies slightly, but its hardness and Young＇s modulus firstly increase followed by a sharp decrease when the temperature surpassing 120 ℃. With the Hall discharging current incrementally rising, the hardness and Young＇s modulus of the film decrease and the surface roughness of the film on 316L stainless steel firstly decreased and then remains constant.     

铷频标物理系统的改进研究

物理系统是铷频标的核心部件,通过分析影响频率稳定度的因素,对物理系统内部结构进行了改进。改进后的物理系统采用分离滤光的三泡结构,增加了光学滤光技术,此外,物理系统还选用了磁控管微波腔。经测试,改进后的铷频标温度系数为9.7×10^-14/℃,频率稳定度约为1×10^-12/τ（1s≤τ≤10 000s）。     

氧化镍电致变色薄膜及其器件的制备与性能研究

以氧化铟锡(ITO)玻璃为基底,采用直流反应磁控溅射法在室温环境下制备了高透过率调制的NiO_x薄膜,利用X射线衍射仪(XRD)、扫描电子电镜(SEM)、紫外可见分光光度计(UV 3600)对薄膜进行分析和表征,研究溅射过程中氩氧比、气压、功率对薄膜结构、形貌及电致变色性能的影响。结果表明：制备的NiO_x薄膜表面有明显的结晶颗粒及孔隙,并沿(200)晶面择优生长;随着气压、功率、氧分压的增大,透过率调制先增大后减小,在时间为45 min、溅射气压4.9 Pa、氩氧比113∶7、功率215 W时最高可达58.3%,着褪色响应时间分别为9和19s,相应的着褪色效率分别为77.56和40.39 cm²/C;以最优工艺的NiO_x薄膜组装了结构为Glass/ITO/NiO_x/Li-electrolyte/WO₃/ITO/Glass的电致变色器件,器件在550 nm处的光调制幅度为46.5%,着褪色时间分别为27和45 s,相应的着褪色速率为1.5和0.9%/s,在循环...     

Silver Film Growth on Glass Ceramic by Radio Frequency Magnetron Sputtering

Thin silver films are deposited by radio frequency magnetron sputtering on glass ceramic at room temperature.Variations of sputtering power,bios voltage and power density are carried out for each deposition,then parts of as-deposited samples are subjected to annealing at 600 ℃ within a vacuum chamber.Structural properties are studied by X-ray diffraction(XRD),scanning electron microscope(SEM)and laser scanning confocal microscope(LSCM).It is shown that structural properties have a strong dependency on sputtering power and annealing temperature.Electrical contact resistance measured by a four point probe instrument is directly affected by the thickness of films.It is also found that the film conductivity,especially in thinner films,is improved by the increasing grain size.Finally,the film adhesion is observed by scratch tests.And the adhesive ability deposited by radio frequency magnetron sputtering shows a better performance than that produced by traditional methods.     

直流磁控溅射ZnO:Al薄膜的光电和红外发射特性

以锌、铝合金(ω(Al)=3%)为靶材,利用直流反应磁控溅射法制备了系列掺铝氧化锌ZnO:Al(ZAO)薄膜样品,通过X射线衍射(XRD)、扫描电子显微镜(SEM)、分光光度计、霍耳效应及红外发射率测量仪等测试仪器或方法表征了样品的结构、形貌、光学、电学及红外发射特性.测得样品最低电阻率达到1.8×10^-6(Ω·m),最大禁带宽度为3.47?eV,可见光区平均透过率达到90%,8~14?μm波段平均红外发射率在0.26~0.9之间.上述特性均随衬底温度和溅射功率的变化有着规律的变化.当方块电阻小于45?Ω时,薄膜在8~14?μm波段平均红外发射率与方块电阻遵循二阶函数变化规律.     

磁性多层膜微波吸收剂的制备

利用磁控溅射设备制备了Fe／SiO2磁性多层膜微波吸收剂。采用扫描电子显微镜(SEM),X射线衍射仪(XRD)对其结构进行表征。将磁性多层膜微波吸收剂制成同轴测试样品,利用网络矢量分析仪测量电磁参数,并针对单层材料进行优化设计。结果表明,该磁性多层膜吸收剂具有较好的微波吸收效果。     

全固态薄膜锂电池研究进展和产业化展望

全固态薄膜锂电池利用固态电解质替代传统电解液,采用多层薄膜堆垛的平面结构,属于新一代的锂离子电池,在军民两用的可穿戴设备、便携式移动电源、汽车和航空动力电池等领域应用前景广阔。该类电池因高安全性、长循环寿命、高比容量和高能量密度等优势性能受到业界广泛关注。本文概述薄膜锂电池的分类和充放电原理,总结正负极、电解质薄膜材料的发展历程和薄膜制备手段的改进,对比各类电池材料的电化学性能,引入该方向最新的研究进展:三维薄膜锂电池,可变形的柔性电池,高电压、大容量电池组。汇总国外商用电池产品、关键优势技术、电池制备设备,提出薄膜锂电池亟待解决的科学问题和国内潜在的产业化方向。