Microstructure and Optical Characterization of Magnetron Sputtered NbN Thin Films

Some fundamental studies on the preparation, structure and optical properties of NbN films were carried out. NbN thin films were deposited by DC reactive magnetron sputtering at different N2 partial pressures and different substrate temperatures ranging from –50 ℃ to 600 ℃. X-ray diffraction analysis (XRD) and scanning electron microscopy (SEM) were employed to characterize their phase com- ponents, microstructures, grain sizes and surface morphology. Optical properties inclusive of refractive indexes, extinction coefficients and transmittance of the NbN films under different sputtering conditions were measured. With the increase in the N2 partial pressure, δ-NbN phase structure gets forming and the grain size and lattice constant of the cubic NbN increasing. The deposited NbN film has relatively high values of refractive index and extinction coefficient in the wavelength ranging from 240 nm to 830 nm. Substrate tem- perature exerts notable influences on the microstructure and optical transmittance of the NbN films. The grain sizes of the δ-NbN film remarkably increase with the rise of the substrate temperature, while the transmittance of the films with the same thickness decreases. Ultra-fine granular film with particle size of several nanometers forms when the substrate is cooled to –50 ℃, and a remarkable aug- mentation of transmittance could be noticed under so low a temperature.     

铷频标物理系统的改进研究

物理系统是铷频标的核心部件,通过分析影响频率稳定度的因素,对物理系统内部结构进行了改进。改进后的物理系统采用分离滤光的三泡结构,增加了光学滤光技术,此外,物理系统还选用了磁控管微波腔。经测试,改进后的铷频标温度系数为9.7×10^-14/℃,频率稳定度约为1×10^-12/τ（1s≤τ≤10 000s）。     

氧化镍电致变色薄膜及其器件的制备与性能研究

以氧化铟锡(ITO)玻璃为基底,采用直流反应磁控溅射法在室温环境下制备了高透过率调制的NiO_x薄膜,利用X射线衍射仪(XRD)、扫描电子电镜(SEM)、紫外可见分光光度计(UV 3600)对薄膜进行分析和表征,研究溅射过程中氩氧比、气压、功率对薄膜结构、形貌及电致变色性能的影响。结果表明：制备的NiO_x薄膜表面有明显的结晶颗粒及孔隙,并沿(200)晶面择优生长;随着气压、功率、氧分压的增大,透过率调制先增大后减小,在时间为45 min、溅射气压4.9 Pa、氩氧比113∶7、功率215 W时最高可达58.3%,着褪色响应时间分别为9和19s,相应的着褪色效率分别为77.56和40.39 cm²/C;以最优工艺的NiO_x薄膜组装了结构为Glass/ITO/NiO_x/Li-electrolyte/WO₃/ITO/Glass的电致变色器件,器件在550 nm处的光调制幅度为46.5%,着褪色时间分别为27和45 s,相应的着褪色速率为1.5和0.9%/s,在循环...     

SiC/ Cu 复合材料的性能

采用磁控溅射技术制备了SiC/Cu复合材料和SiC、Cu膜.用SEM和XRD对材料的微观结构进行观察和分析,压痕测试和拉伸实验结果表明:SiC/Cu复合材料的层状结构清晰,其韧性和拉伸强度相对于SiC材料有很大提高,但显微硬度有所降低.断口分析表明:裂纹偏转、金属塑性变形、宏观桥联等是其拉伸强度提高的主要原因.     

极小型氢频标磁控管微波腔的仿真设计

用Ansoft HFSS仿真软件建立了极小型氢频标磁控管微波腔的几种模型结构,在给定腔体尺寸下,仿真了不同电极间距的空型和磁控管型微波腔谐振频率和品质因数,得出极小型氢频标磁控管微波腔的设计参数,并对实际设计中影响磁控管微波腔谐振频率的因素给出了建议。     

小型氢原子频标微波腔本征值问题的计算机仿真分析

使用Ansoft HFSS软件分别仿真计算了氢原子频标中标准尺寸微波腔、蓝宝石部分介质充填微波腔和不同金属极片间距的磁控管微波腔,并分析了储存泡对谐振频率的影响,得到极片间距和储存泡对谐振频率的影响趋势,对于实际工作时主要影响谐振频率的极片间距的选择给出了建议。     

对超小型磁控管微波腔频移的分析

用AnsoftHFSS仿真软件建立了超小型氢频标磁控管微波腔的模型结构,对仿真设计微波腔的各种频移进行了分析。     

M50钢表面磁控溅射Ti-GLC薄膜高温摩擦学性能

为了研究高温环境下轴承钢基体上Ti掺杂类石墨碳基薄膜的实际应用,采用非平衡磁控溅射技术在M50钢表面制备Ti-GLC膜,分别在不同温度、不同线速度下与Al₂O₃陶瓷球进行摩擦磨损试验,研究其高温摩擦学性能及磨损机理。结果表明,随着温度的升高,Ti-GLC膜中的sp²键含量逐渐增大,石墨化程度加重,硬度和弹性模量逐渐降低,膜基结合力也有所降低。在室温～200℃,所制备的Ti-GLC薄膜保持优异的低摩擦与耐磨损性能,为Ti-GLC薄膜的最佳服役温度区域。在200 mm/s下,随着温度的升高,磨损形式由轻微的黏着磨损和磨粒磨损逐渐转变为严重的磨粒磨损和氧化磨损。     

Magnetic and Optical Properties of the TiO2-Co-TiO2 Composite Films Grown by Magnetron Sputtering

The TiO2-Co-TiO2 sandwich films were successfully grown on glass and silicon substrata making alternate use of radio frequency reactive magnetron sputtering and direct current magnetron sputtering. The structures and properties of these films were identified with X-ray diffraction (XRD), Raman spectra and X-ray photoemission spectra (XPS). It is shown that the sandwich film consists of two anatase TiO2 films with an embedded Co nano-film. The fact that, when the Co nano-film thickens, varied red shifts appear in optical absorption spectra may well be explained by the quantum confinement and tunnel effects. As for magnetic properties, the saturation magnetization, remnant magnetic induction and coercivity vary with the thickness of the Co nano-films. Moreover, the Co nano-film has a critical thickness of about 8.6 nm, which makes the coercivity of the composite film reach the maximum of about 1413 Oe.     

某型导弹雷达通用磁控管自动老炼仪的设计

介绍了某型导弹雷达导引头通用磁控管自动老炼仪的组成和工作原理,重点介绍了磁控管电流检测过程中为消除噪声对检测结果的影响而采取的综合措施,实践表明,采取该措施后可以有效克服噪声对磁控管电流检测结果的影响。