Kinetic Monte Carlo Simulation of EB-PVD Film： Effects of Substrate Temperature

The 2D kinetic Monte Carlo （KMC） simulation was used to study the effects of different substrate temperatures on the microstructure of Ni-Cr films in the process of deposition by the electron beam physical vapor deposition （EB-PVD）. In the KMC model, substrate was assumed to be a ＂surface＂ of tight-packed rows, and the simulation includes two phenomena： adatom-surface collision and adatom diffusion. While the interaction between atoms was described by the embedded atom method, the jumping energy was calculated by the molecular static （MS） calculation. The initial location of the adatom was defined by the Momentum Scheme. The results reveal that there exists a critical substrate temperature which means that the lowest packing density and the highest surface roughness structure will be achieved when the temperature is lower than the smaller critical value, while the roughness of both surfaces and the void contents keep decreasing with the substrate temperature increasing until it reaches the higher critical value. The results also indicate that the critical substrate temperature rises as the deposition rate increases.     

基于频谱和倒谱分析的探地雷达地杂波抑制

超宽带探地雷达被广泛用于检测浅层埋藏的反人员地雷,其中滤除强的地表反射回波是完成目标检测、成像与识别的关键。将独立分量分析算法与数据非一致性检测方法相结合,通过分析独立分量的频谱和倒谱,给出了一种可以适应多目标数据区域且自动选取独立分量的地杂波抑制方法。实验结果证明了该方法的可行性和有效性。     

镍基合金激光熔覆MCrAlY涂层基体裂纹的成因与控制

在分析激光熔覆涂层基体裂纹形成机理的基础上,针对采用激光熔覆技术在镍基合金基体上制备MCrAlY涂层存在基体裂纹的问题,提出了缓冷处理的止裂措施,研究了将熔覆后的涂层置于300℃下保温30min随炉缓冷和置于已预热至300℃的保温箱中随箱缓冷两种缓冷工艺对基体裂纹的控制行为.结果表明:镍基合金激光熔覆MCrAlY涂层基体裂纹主要是由于熔覆过程中的快速冷却所致;两种缓冷工艺均能有效地避免基体裂纹的产生,但保温随炉缓冷处理会引起熔覆层组织粗大、枝品特征明显等不良影响,而随箱缓冷处理涂层对熔覆层组织并未产生不良影响.     

高纯氧化铝基板的制备要点与宇航应用验证实践

通过分析高纯氧化铝陶瓷基板的制备要点，梳理了制备关键工艺与基板特性指标之间的关系，梳理出星用高纯氧化铝陶瓷基板的验证需求，最终提出了高纯氧化铝基板的验证思路，即在将全部验证项目分为构件级和组件级两个大类的基础上，进一步建立起三级验证指标体系。就具体验证项目的设计与实践，进行了细致的分析讨论。得出结论，验证过程体现出的既基于已有标准框架和测试原理，又不拘泥于某一特定标准的原则与思路，不仅适合于构件级的批次稳定性与工艺适用性验证，同样也适用于组件级各验证项目和具体测试方法的确定。在确保构件级和组件级全面、准确验证的前提下，为确保较高的验证效率和较低的验证成本，需要结合标准、测试条件、应用工况三方面综合考虑和细化验证项目条件。