薄膜生长工艺对TiO_2基紫外探测器光电性能的影响

分别采用磁控溅射和溶胶-凝胶工艺制备了相同厚度的TiO2薄膜,并用以制备了金属-半导体-金属(MSM)结构TiO2基紫外探测器。通过紫外光电性能测试、扫描电子显微镜(SEM)观察及X射线衍射(XRD)分析,研究了TiO2薄膜生长工艺对探测器光电性能的影响规律。结果表明:磁控溅射工艺下,探测器的光电流虽然较低,但响应时间和暗电流远小于溶胶-凝胶工艺制备的探测器,其具备了高辐射灵敏度和快速响应特性。磁控溅射工艺制备的TiO2薄膜结构较为致密,晶界和缺陷较少,方阻较高,这是其取得优良的光电特性的原因。     

Co/NM/FM(NiFe and Co)纳米多层膜的层间耦合效应

巨磁电阻自旋阀多层膜作为磁敏传感器材料与磁随机存储器(MRAM)材料，具有高的可靠性与灵敏度，在航空航天等高科技领域有着极大的应用前景。研究多层膜各层间的耦合效应与各层厚度、磁学性能之间的内在关系，对提高自旋阀的巨磁电阻效应、磁灵敏性等具有重要的作用。本研究采用磁控溅射沉积制备了(Cu／Co、Cu／NiFe，Ta／NiFe双层膜与Co／Cu／Co、Co／Cu／NiFe、Co／Ta／NiFe)三明治结构薄膜。采用振动样品磁强计对薄膜磁性、四探针法对薄膜磁阻性能进行了测试研究，采用洛仑兹电子显微镜法观察了薄膜的磁畴结构。研究结果表明，层间耦合效应不仅与非磁性中间层的厚度相关，而且与中间层材料的特性相关。磁阻与磁畴观察均表明层间耦合效应随中间层厚度的增加而减小，而Cu作为中间层的多层膜的层间耦合大于Ta作为中间层的层间耦合。     

Microstructure and Optical Characterization of Magnetron Sputtered NbN Thin Films

Some fundamental studies on the preparation, structure and optical properties of NbN films were carried out. NbN thin films were deposited by DC reactive magnetron sputtering at different N2 partial pressures and different substrate temperatures ranging from –50 ℃ to 600 ℃. X-ray diffraction analysis (XRD) and scanning electron microscopy (SEM) were employed to characterize their phase com- ponents, microstructures, grain sizes and surface morphology. Optical properties inclusive of refractive indexes, extinction coefficients and transmittance of the NbN films under different sputtering conditions were measured. With the increase in the N2 partial pressure, δ-NbN phase structure gets forming and the grain size and lattice constant of the cubic NbN increasing. The deposited NbN film has relatively high values of refractive index and extinction coefficient in the wavelength ranging from 240 nm to 830 nm. Substrate tem- perature exerts notable influences on the microstructure and optical transmittance of the NbN films. The grain sizes of the δ-NbN film remarkably increase with the rise of the substrate temperature, while the transmittance of the films with the same thickness decreases. Ultra-fine granular film with particle size of several nanometers forms when the substrate is cooled to –50 ℃, and a remarkable aug- mentation of transmittance could be noticed under so low a temperature.     

飞机座舱有机玻璃透明导电膜的制备及透光和微波散射性能

研究了用溅射法在飞机座舱有机玻璃上镀制金属-介质组合透明导电膜的工艺 ;测试和分析了金膜、银膜、氧化钛膜的光学特性、导电性及形貌结构 ;按薄膜光学原理进行膜系匹计算 ,并分别镀制了 Ti O2-Au-Ti O2 、 Ti O2-Ag-Ti O2 组合透明导电膜。在 40 0～ 760 nm可见光波段内 ,透光率分别达到了 74%和 81 % ,在 8～ 1 2 GHz频段内对垂直入射的微波 ,反射率分别达到-1 .1 d B和-0 .8d B。     

Ag/TiO2/ITO紫外探测器的制备及其光电性能

采用胶体晶体模板技术,结合磁控溅射工艺,制备出光电性能较为优异的 Ag反点阵列/TiO2/ITO三明治结构紫外探测器。通过扫描电子显微镜( SEM)、XRD、四探针测试仪及半导体参数测试仪对探测器的微观结构和光电性能进行了测试与表征。结果表明：反点阵列孔径对探测器光电性能影响较为显著;随着孔径增大,探测器的暗电流逐渐增大,光电流先增大后减小,响应时间逐渐延长;孔径为4.2μm时,探测器的光电性能达到最佳;孔径较大的反点阵列电极,具有较高的电导率、较低的紫外光透过率以及较大的光生电子-空穴的复合概率。     

TiO2基紫外探测器的制备及退火工艺对光电性能的影响

采用磁控溅射方法,通过不同工艺的退火处理,制备了光电性能优良的TiO2基紫外探测器.通过紫外光电性能测试、扫描电子显微镜( SEM)观察及X射线衍射(XRD)分析,研究了退火工艺对探测器光电性能的影响规律.结果表明:随着退火温度的增加,TiO2晶粒尺寸显著增大,晶界和缺陷数量的变化是导致TiO2基紫外探测器的光电性能随退火工艺变化的根本原因.经500℃/2h退火后,紫外探测器的光电流高出暗电流近2.5个数量级,紫外波段的光响应高出可见光波段近2个数量级,所制备紫外探测器达到了高辐射灵敏度和可见盲特性的要求.     

飞机座舱复合玻璃电磁性能和透光性能研究

 研究了电磁性能 ,如电磁波后向散射功率、吸收功率以及反射功率与透明导电膜的内在关系 ;研究透光性能 ,如光学膜系的优化设计等。提出了透明导电膜与多层玻璃合理组合以提高电磁性能 ;薄金属膜与多层光学膜合理匹配以提高透光率。采用溅射和蒸发镀膜方法分别实现了上述优化设计的光学膜系结构 ,并与多层玻璃合理层合后 ,斜入射电磁后向散射功率下降 1 0 d B,透光率可达到 77%。     

Al/Ni含能多层膜在Al2O3陶瓷/不锈钢焊接中的应用

采用磁控溅射设备,生长AuSn合金做焊料层、Al/Ni含能多层膜做热量提供层,实现了不锈钢和Al_2O_3间的异质材料自蔓延高温扩散焊。利用SEM、XRD和DSC等测试手段表征AuSn合金和Al/Ni含能多层膜的微观形貌、相成分和放热量;用万能试验机测试焊接接头的力学性能。结果表明,AuSn合金的质量比基本达到80∶20,而多层膜的层状结构清晰,反应热达到1 239 J/g。焊接实验结果表明,仅使用AuSn焊料时,剪切强度仅为46 MPa,在增加Al/Ni含能多层膜后,其剪切强度可达90 MPa,强度提高了约一倍。焊接接头的界面显微形貌和相结构研究表明,剪切强度的增强主要是Al/Ni多层膜提供了额外能量使得界面处的反应剧烈,陶瓷金属化层与中间层的反应加剧,形成了新的反应生成物。     

磁控溅射沉积工艺条件对薄膜厚度均匀性的影响

薄膜厚度均匀性是衡量薄膜质量和镀膜装置性能的一项重要指标.在自行设计的磁控溅射沉积设备上,对薄膜沉积工艺中靶基间距、溅射功率、工作气压对膜厚均匀性的影响进行了研究,由连续光谱椭圆偏光仪SE800测量薄膜厚度.结果表明:靶基间距较大的情况下,薄膜均匀性明显改善;溅射功率和工作气压对薄膜均匀性也有较大的影响.     

磁性多层膜微波吸收剂的制备

利用磁控溅射设备制备了Fe／SiO2磁性多层膜微波吸收剂。采用扫描电子显微镜(SEM),X射线衍射仪(XRD)对其结构进行表征。将磁性多层膜微波吸收剂制成同轴测试样品,利用网络矢量分析仪测量电磁参数,并针对单层材料进行优化设计。结果表明,该磁性多层膜吸收剂具有较好的微波吸收效果。     

Microstructure and Magnetic Anisotropy of FeCoNbB Films

Effect of Nb contents on microstructure and magnetic properties of FeCoNbB films has been studied. X-ray diffraction (XRD) analysis reveals that Nb plays a role in refining grain and in facilitating formation of amorphous structure. When Nb content is more than 8 at%, the films transform from crystalline to amorphous structure, accompanied by variations in magnetic properties. An unusual out-of-plane anisotropy component is consequently observed. It can be suggested that the anisotropy induced by increasing Nb contents be attributed to stress-related magnetoelastic anisotropy. The undesirable anisotropy is greatly reduced by thermal annealing, reducing film thicknesses or applying an external magnetic field together with Si addition.     

ITO透明导电膜的制备及性能

研究了用直流反应磁控溅射法在无机玻璃基片上制备ＩＴＯ透明导电膜的工艺;测试了膜的电阻率、对可见光的透射率及对垂直入射微波的反射率和透射率;研究了反应溅射时氧浓度、溅射后退火气氛对电阻率和透光率的影响;ＩＴＯ膜方块电阻对微波反射率和透射率的影响     

多弧离子镀Cr/Cr2O3薄膜红外及可见光谱特性

采用多弧离子镀制备了具有不同色彩的Cr/Cr2O3薄膜,利用紫外-可见光分光光度计研究了薄膜在可见和红外波段的光谱特性,利用SEM进行薄膜表面结构和形貌的分析,利用四探针测阻仪测试了样品的方块电阻,利用红外发射率测量仪测试了样品的红外发射率。结果表明:Cr/Cr2O3薄膜具有丰富的色彩,在可见光区有明显的反射峰,可见光区光谱特性主要受膜厚的影响,方块电阻随膜厚增加而有变大,样品的红外发射率主要取决于金属层,平均红外发射率最小降至0.371。     

Preparation and Microstructure of Highly-Oriented LaNiO_3 Thin Films by RF Sputtering Method

In an attempt of being used as buffer layers and electrodes for the textured BaTiO3 (BTO) ferroelectric thin films, highly (100)-oriented LaNiO3 (LNO) thin films of different thicknesses were deposited directly on Si (100) substrate with radio-frequency (RF) magnetron sputtering method. It is observed that the substrate temperatures and the film thicknesses bring main influences on the micro-structures and orientation of the thin film. The effects of the thicknesses and substrate temperatures on the orientation of the films were studied on the LNO films of different thicknesses. The highly (100)-oriented LNO thin films were obtained at the substrate temperature of 600 ℃. The existence of epitaxially grown BTO films indicates that the oriented LNO thin films obtained in this work could be used as a buffer layer for epitaxial growth.     

钛合金阳极氧化膜的XPS研究

利用XPS分析了TCA钛合金经阳极氧化处理后,表面氧化膜的成分和结构及其随深度的变化.研究表明,钛合金阳极氧化膜表面为单一的TiO_2,并以晶态和非晶态的形式存在于氧化膜中.随着氧化膜厚度的增加,内部氧化越来越不充分,TiO_2的含量减少,并逐渐出现Ti:O_3、TiO;并且阳极氧化处理明显增厚了表面氧化膜.     

离子束辅助沉积WS_2-Ti-Ag复合薄膜的摩擦性能

采用ZDH-100型号离子束复合沉积设备沉积WS_2-Ti-Ag复合薄膜,基材为轴承钢和单晶硅(100).采用场发射扫描电子显微镜、XRD衍射仪,检测复合薄膜的表面形貌、微观结构.采用球-盘式摩擦磨损试验机,对复合薄膜在大气环境中的摩擦性能进行了研究.结果表明:采用离子束辅助沉积技术制备的WS_2-Ti-Ag复合薄膜是非晶态薄膜;并且随法向载荷的增加,复合薄膜的摩擦因数减小,摩擦状态越稳定,耐磨寿命越短.     

Preparation and Photoluminescence of ZnO Nanostructures

Porous anodic alumina (PAA) hosts with ZnO nanoparticles loaded in were prepared by immersing PAA films in an aqueous solu-tion of zinc acetate and then annealing at high temperatures. Highly ordered ZnO nanodot arrays were produced using the method in combination of PAA template with RF magnetron sputtering deposition. The photoluminescence of the ZnO/PAA composite and the highly ordered ZnO nanodot arrays were investigated by means of a fluorescent spectrometer. The ZnO/PAA composite exhibits intense and broad photoluminescence spectra with the peak position at around 485 nm. The ZnO nanodot arrays have a strong UV light emissive peak at about 380 nm and a wide light emissive peak at 460 nm-610 nm at the room temperature.     

Fabrication of Diamond-like Carbon Films by Ion Assisted Middle Frequency Unbalanced Magnetron Sputtering

Diamond-like carbon (DLC) films are deposited by the Hall ion source assisted by the mid-frequency unbalanced magnetron sput-tering technique. The effects of the substrate voltage bias, the substrate temperature, the Hall discharging current and the argon/nitrogen ratio on the DLC film’s performance were studied. The experimental results show that the film’s surface roughness, the hardness and the Young’s modulus increase firstly and then decrease with the bias voltage incrementally increases. Also when the substrate temperature rises, the surface roughness of the film varies slightly, but its hardness and Young’s modulus firstly increase followed by a sharp decrease when the temperature surpassing 120 ℃. With the Hall discharging current incrementally rising, the hardness and Young’s modulus of the film decrease and the surface roughness of the film on 316L stainless steel firstly decreased and then remains constant.     

脉冲激光辐射下VO_2薄膜的光限幅性能

采用反应溅射和后续退火工艺,在石英衬底上制备具有热致相变特性的VO_2薄膜,并对薄膜的光学性能进行表征。研究发现:在弱光辐射下,随着温度的改变,薄膜的透射率在可见及近红外光区会发生显著变化,具有良好的相变光开关特性;在强光辐射下,制备的VO_2薄膜同样具有良好的红外光调制深度;当脉冲激光波长为1064 nm时,随着脉冲能量的逐渐增强,薄膜的表面反射率逐渐降低,光限幅性能呈现出先升高再降低的趋势,其透射率最低可降至7%,薄膜的脉冲激光损伤阈值约为50 mJ/cm~2。     

La3＋掺杂 Ni0．35 Co0．15 Zn0．5 Fe2 O4铁氧体的制备及微波吸收性能

采用溶胶-凝胶自蔓延法制备 La3＋掺杂 Ni0．35 Co0．15 Zn0．5 Fe2 O4,并研究不同掺杂量对样品微观结构、电磁参数及微波吸收性能的影响。通过 X 射线衍射仪、扫描电镜研究了样品的相结构和微观形貌,使用振动样品磁强计与矢量网络分析仪分别对样品的静态磁性能及在1～12GHz 的电磁参数进行了研究,并计算了不同厚度（3 mm、5 mm、8 mm）下材料的反射损耗。研究表明,适量掺杂 La3＋能够提高 Ni0．35 Co0．15 Zn0．5 Fe2 O4铁氧体的吸波性能,并使吸收频带向高频移动。其中样品 Ni0．35 Co0．15 Zn0．5 La0．04 Fe2 O4与石蜡混合厚度为5mm 时,最小反射损耗为－28．4dB,小于－10dB 带宽为3．7GHz。