TiNi基形状记忆合金薄膜的相变特征研究

利用磁控溅射的方法在单晶Si和非晶SiO2基片上制备了TiNi和TiNiCu形状记忆合金薄膜,并利用示差扫描量热法和基片曲率法研究了薄膜的相变特征及应力随温度的变化.研究结果表明450℃溅射形成的记忆合金薄膜具有良好的形状记忆效应,在微电子机械系统有很好的应用前景.TiNi薄膜降温时出现R相变,因而发生两步相变,而TiNiCu薄膜中马氏体和奥氏体间直接转变.基片以及薄膜成份对相变点有很大的影响.单晶Si片作为基片时,记忆合金薄膜和基片间有很好的结合力,而SiO2作为基片时,记忆合金薄膜容易剥落.     

Phase Transformation and Microstructure of Ti50Ni48-xFe2Ndx Shape Memory Alloys

The influences of rare earth element Nd on the phase transformation and the microstructure of Ti₅₀Ni_48−xFe₂Nd_x shape memory alloys are investigated by means of electrical resistivity, optical microscopy, electron probe microanalyzer, and X-ray diffraction. The results show that TiNiFe alloys with different Nd contents exhibit two-step martensitic transformation. The start temperature of martensitic transformation increases sharply from 212 K to 267 K when 0.1 at.% Nd is added in, and then decreases gradually if Nd content further increases. The microstructure of TiNiFeNd quaternary alloys consists of TiNi matrix, Ti₂Ni second phase, and Nd₃Ni intermetallic compound. The spherical Nd₃Ni precipitate-particles evenly disperse in the matrix.