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原子层沉积纳米钝化层薄膜厚度测量技术研究
引用本文:李建国,惠龙飞,秦利军,龚婷,张王乐.原子层沉积纳米钝化层薄膜厚度测量技术研究[J].宇航计测技术,2019,39(3):1.
作者姓名:李建国  惠龙飞  秦利军  龚婷  张王乐
作者单位:1、西安近代化学研究所,陕西西安 710065
摘    要:原子层沉积无机纳米薄膜技术广泛应用于军民领域。本文通过在原子层沉积系统加装原位石英晶体微天平测量系统,通过原位石英晶体微天平研究原子层沉积无机薄膜生长过程并进行薄膜厚度的在线测量。通过研究原子层沉积反应条件,实现原子层沉积无机薄膜厚度的石英晶体微天平在线测量结果替代薄膜厚度线下光学测量结果,解决各类复杂腔体内壁原子层沉积薄膜厚度无法精确测量的问题。

关 键 词:原子层沉积  石英晶体微天平  原位测量  

Research on In-situ Thickness Measurement of Atomic Layer #br# Deposition Nano-Passivation Layers
LI Jian-guo,HUI Long-fei,QIN Li-jun,GONG Ting,ZHANG Wang-le.Research on In-situ Thickness Measurement of Atomic Layer #br# Deposition Nano-Passivation Layers[J].Journal of Astronautic Metrology and Measurement,2019,39(3):1.
Authors:LI Jian-guo  HUI Long-fei  QIN Li-jun  GONG Ting  ZHANG Wang-le
Institution:1、Xian Modern Chemistry Research Institute,Xian 710065,China
Abstract:Atomic layer deposition of inorganic nano-film technology is widely used in military and civilian applications.In this paper,the in-situ quartz crystal microbalance measurement system was used to study the growth process of atomic layer deposition inorganic film,and the film thickness was measured by quartz crystal microbalance.By studying the atomic layer deposition reaction conditions,the in-situ measurement results of the inorganic film thickness of the atomic layer deposition are used instead of the optical measurement results of the film thickness.It can solve the problem that the thickness of the atomic layer deposited film in various complex chambers cannot be accurately measured.
Keywords:Atomic layer deposition  Quartz crystal microbalance  In-situ measurement  
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