石英玻璃的等离子体抛光技术研究现状

具有耐腐蚀、热膨胀系数低等诸多优良物理化学特性的石英玻璃在高性能光学系统中被广泛使用。要求元件达到纳米级别的表面粗糙度，而且没有损伤层和残余应力，因此精加工之后的超精密抛光工序尤为重要。本文介绍了气囊、磁流变、弹性发射、离子束等几种石英玻璃的精密抛光方法，侧重阐述了国内外等离子体的抛光技术，包括等离子体辅助化学刻蚀、等离子体喷射加工、等离子化学蒸发加工研究进展及取得的成果；且对等离子体的未来发展进行概述。

Research Status of Plasma Polishing Technology for Quartz Glass

Quartz glass with many excellent physical and chemical properties such as corrosion resistance and low thermal expansion coefficient is widely used in high-performance optical systems. The components are required to have nano-level surface roughness without damage and residual stress. Therefore, the ultra-precision polishing process after finishing is particularly important. This article introduces several precision polishing methods of quartz glass such as bonnet polishing, magnetorheological finishing, elastic emission machining, ion beam machining, etc., and focuses on the plasma polishing technology domestic and overseas, including plasma assisted chemical etching, plasma jet machining, plasma chemical vaporization machining. An overview of the future development of plasma is also presented.