| 化学气相沉积TiN薄膜及其耐磨性能 |
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| 引用本文： | 苗建旺,王超,周春根.化学气相沉积TiN薄膜及其耐磨性能[J].航空学报,2008,29(6):1687-1691. |
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| 作者姓名： | 苗建旺 王超 周春根 |
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| 作者单位： | 北京航空航天大学材料科学与工程学院,北京,100191 |
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| 摘 要： | 采用化学气相沉积的方法制备TiN薄膜，以提高K3镍基高温合金的耐磨性能。以TiCl4 和NH3为反应气体，用化学气相沉积法(CVD) 在K3镍基高温合金基体上制备了一系列不同温度和沉积时间的TiN 薄膜。结果表明，与基体相比，沉积TiN薄膜的样品耐磨性能有显著提高。当沉积温度不变时，TiN薄膜耐磨性能随沉积时间的延长先提高后降低；当沉积时间不变时，薄膜的耐磨性能随沉积温度的升高而提高。化学气相沉积法制备TiN薄膜的最佳工艺条件为600 ℃/60 min。
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| 关 键 词： | TiN 薄膜 化学气相沉积 硬度 耐磨性能 |
Preparation and Wear-resistant Properties of TiN Films by CVD |
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| Miao Jianwang,Wang Chao,Zhou Chungen.Preparation and Wear-resistant Properties of TiN Films by CVD[J].Acta Aeronautica et Astronautica Sinica,2008,29(6):1687-1691. |
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| Authors: | Miao Jianwang Wang Chao Zhou Chungen |
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| Institution: | Miao Jianwang,Wang Chao,Zhou Chungen (School of Materials Science , Engineering,Beijing University of Aeronautics , Astronautics,Beijing 100191,China) |
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| Abstract: | In order to improve the wear-resistance of K3 Ni-based super alloy,TiN coating is deposited by chemical vapor deposition (CVD) method at different temperatures and deposite times. The reactant gas is TiCl4/NH3. Results show that the wear-resistance of the alloys deposited with TiN is greatly improved compared with those alloy without TiN films. At a set deposition temperature,the wear resistance of TiN coatings becomes better at first and then decreases with increasing deposition time. With the same deposit... |
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| Keywords: | TiN |
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