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过滤式阴极电弧沉积类金刚石薄膜工艺研究
引用本文:朱纪军,左敦稳.过滤式阴极电弧沉积类金刚石薄膜工艺研究[J].航空精密制造技术,1998(6).
作者姓名:朱纪军  左敦稳
作者单位:南京航空航天大学机电工程学院
摘    要:研究了过滤式阴极电弧沉积系统的稳弧工艺参数,通过正交试验获得最佳稳弧参数。并且研究了弯管内置挡板对宏观粒子过滤效果的影响。采用喇曼光谱研究了偏压对生成的类金刚石薄膜性能的影响,证明-100V偏压下获得的类金刚石薄膜有最佳的SP3含量。扫描电镜测试表明,在(111)硅基片上获得致密的膜,但在高速钢基体上沉膜堆积现象比较严重,不易获得优质类金刚石膜。同时也给出了类金刚石的原子力显微照片(AFM),表明稳弧参数对类金刚石薄膜表面形貌有较大的影响。

关 键 词:阴极电弧  类金刚石薄膜  稳弧参数  挡板  偏压

Research on the Manufacture of Perforated Cathode Arc Deposied DLC Films
Zhu Jijun,Zuo Dunwen,Wang Min.Research on the Manufacture of Perforated Cathode Arc Deposied DLC Films[J].Aviation Precision Manufacturing Technology,1998(6).
Authors:Zhu Jijun  Zuo Dunwen  Wang Min
Abstract:In this paper, the arc stabilized manufacturing parameter is studied. The optimum arc stabilized parameter is got through orthogonal test. The influence of baffler, which is built in elbow, on macro particle filter efficiency is also studied. By using Roman spectrum, it states the influence of bias voltage on the performance of diamond-like carbon (DLC) films. It identifies that under 100 bias voltage the optimum SP 3 content of DLC films can be got. The scanning electron microscope tests show that compact films can be obtained in silicon based chip while in high-speed steel matrix the films deposition is too much, which makes the forming of high quality DLC films be quite difficult. At the same time, atomic force microphotography (A FM) of DLC rilms is given, which shows that arc stabilized parameter have great influence on the appearance of DLC films.
Keywords:cathode arc    DLC films    arc stabilized parameter    baffler    bias voltage  
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