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| 平面研磨抛光轨迹研究 | |
| 引用本文： | 赵萍,陶黎,王志伟,袁巨龙.平面研磨抛光轨迹研究[J].航空精密制造技术,2009,45(2). |
| 作者姓名： | 赵萍 陶黎 王志伟 袁巨龙 |
| 作者单位： | 1. 浙江工业大学教育科学与技术学院,杭州,310014 2. 浙江工业大学机械制造与自动化教育部重点实验室,杭州,310014 3. 浙江工业大学机械制造与自动化教育部重点实验室,杭州,310014;湖南大学国家高效磨削工程技术研究中心,长沙,410082 |
| 基金项目： | 国家自然科学基金重点项目 |
| 摘 要： | 介绍了平面研磨抛光轨迹均匀性的研究方法,详细阐述了双轴式(包括定偏心式和不定偏心式)、直线式、摇摆式、计算机控制小工具式单面研磨抛光轨迹和行星式双面研磨抛光轨迹的数学函数及其轨迹均匀性,指出了当前轨迹研究中存在的不足. |
| 关 键 词： | 平面研磨 平面抛光 研磨轨迹 轨迹均匀性 |
Review on Trace of Plane Lapping/polishing |
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| ZHAO Ping,TAO Li,WANG Zhi-wei,et al.Review on Trace of Plane Lapping/polishing[J].Aviation Precision Manufacturing Technology,2009,45(2). | |
| Authors: | ZHAO Ping TAO Li WANG Zhi-wei |
| Institution: | 1. College of Educational Science & Technology;Zhejiang University of Technology;Hangzhou 310014 2. MOE Key Laboratory of Mechanical Manufacture and Automation;College of Mechanical & Electrical Engineering;Hangzhou 310014 3. National Engineering Research Center for High Efficiency Grinding;Changsha 410082 |
| Abstract: | The trace of plane lapping/polishing is reviewed, involving single side and double side lapping/polishing mode. The former includes several types of two-axle (certain and uncertain eccentricity), linear, oscillating, computer-controlled small tool and the latter is planetary lapping/polishing mode. The research method of the trace uniformity of plane lapping/polishing is described, and the mathematical function and the uniformity of trace for lapping/polishing modes mentioned above are discussed, and the de... |
| Keywords: | plane lapping plane polishing lapping trace trace uniformity |
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