| 应用不等栅距光栅的光刻对准系统 |
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| 引用本文： | 张国范.应用不等栅距光栅的光刻对准系统[J].航空精密制造技术,1998(1). |
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| 作者姓名： | 张国范 |
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| 作者单位： | 中国航空精密机械研究所 |
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| 摘 要： | 介绍一种在分步投影光刻机中，采用不等栅距光栅进行对准的系统。详细介绍了该系统的光学原理、所采用对准目标的刻线形式、空间滤波的方法、信号处理的方法和对系统有影响的误差源以及改进措施。
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| 关 键 词： | 微细加工，光刻对准，不等栅距光栅 |
The Photolithography Alignment system Using Gratings with Different Constant |
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| Zhang Guofan.The Photolithography Alignment system Using Gratings with Different Constant[J].Aviation Precision Manufacturing Technology,1998(1). |
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| Authors: | Zhang Guofan |
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| Institution: | Zhang Guofan |
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| Abstract: | In this paper,an optical alignment system is introduced using gratings with different constant for the step projection photoetching machine.The details are given to optical principle,the grating form in the alignment mark,the metods of spatial filtering and signal processing,and the error sources and improving measures are detailed. |
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| Keywords: | submicro peocessing photolithography alignment gratings with different constant |
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