光学加工射频离子源的去除函数与稳定性研究

在研究了射频离子源的结构、工作原理和性能的基础上，进行了光学镜面抛光离子束的去除效率与稳定性测试。实验结果表明射频离子源去除函数的形状为回转高斯形，利用Φ15mm的栅网，在靶距为30mm、离子能量900eV时，去除函数的峰值去除率为194nm/min,体积去除率为19.2×10-3mm3/min，半峰全宽值为9.2mm；并且去除函数的峰值去除率与体积去除率的变化均在3%以内，半峰全宽值的变化在1.7%以内。因此，射频离子源具有光学镜面抛光加工所需的去除效率，而且射频离子源具有好的稳定性，具备光学加工的潜能。

Removal Function and Stability Study of RF Ion Source for Optics Figuring

Based on the research of the RF (Radio Frequency) ion sources' structure, discharging principle and property, the removal efifciency and stability of the ion beam for Optics surface ifguring has been tested. The experiment result indicates that the removal function of the RF ion source is rotated Gauss type. Using the Φ15mm diameter grid, under the parameters like target distance is 30mm and the ion energy is 900eV, the experiment turns out that the peak removal efifciency of the removal function is 194nm/min, the volume removal efifciency is 19.2×10-3mm3/min, and the FWHM (full width at half maximum) is 9.2mm; It is found that the removal function's peak removal efifciency and the volume removal efifciency both varies in 3%, the FWHM varies in 1.7%. In that case, the RF ion source has the removal efifciency that Optics ifguring needed, and has good stability. In conclusion, the RF ion source has the potential in Optics ifguring.