| TiN膜离子注入与沉积工艺研究 |
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| 引用本文： | Huafang Zhang Hongchen Wu Yanli Jiang,Guojia Ma Liping Peng.TiN膜离子注入与沉积工艺研究[J].航空制造技术,2004(Z1):255-258. |
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| 作者姓名： | Huafang Zhang Hongchen Wu Yanli Jiang Guojia Ma Liping Peng |
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| 摘 要： | 采用离子注入、沉积、动态混合注入沉积工艺,在硅基体上制备TiN膜层.用纳米划痕法检测成膜质量,用扫描电镜观察划痕形貌.对比分析结果表明,动态混合离子注入沉积工艺对提高膜层与基体的结合性能效果显著.
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| 关 键 词： | 动态混合离子注入沉积 TiN膜 纳米划痕 结合性能 |
Study on Ion Implantation and Deposition Technology of TiN Films |
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| Huafang Zhang,Hongchen Wu,Yanli Jiang,Guojia Ma,Liping Peng.Study on Ion Implantation and Deposition Technology of TiN Films[J].Aeronautical Manufacturing Technology,2004(Z1):255-258. |
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| Authors: | Huafang Zhang Hongchen Wu Yanli Jiang Guojia Ma Liping Peng |
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| Abstract: | TiN films are obtained by ion implantation, deposition process or by combination of them on Si substrate. The qualities of TiN films are studied by means of nano scratch test, SEM is used to observe the scratch morphologies. The results show that dynamic combination of ion implantation and deposition process can prominently increase the joint property between the films and substrate. |
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| Keywords: | Dynamic combination of implantation and deposition process TiN films Nano scratch Adherence property |
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