CVD技术制备Ta/W层状复合材料

运用化学气相沉积(Chemical Vapor Deposition,CVD)技术制备了W体积分数分别10%,13%和18%的Ta/W两层层状复合材料,采用金相显微镜(OM)、扫描电镜(SEM)和室温拉伸实验对复合材料的性能进行分析。结果表明:运用CVD技术可以制备W体积分数不同,且密度优于理论密度99.4%的层状复合材料;复合材料中Ta,W层的晶粒均为柱状晶粒,离界面越近,晶粒越细;沉积态复合材料的力学性能优于纯CVD Ta和CVD W;1600℃×2 h的热处理后,复合材料的界面扩散层宽度显著增大,力学性能高于沉积态的力学性能,最高抗拉强度可达660 MPa。

Preparation of Ta/W Composite by CVD

The Ta/W composites with 10%W,13%W and 18%W were prepared by chemical vapor deposition (CVD).The properties of Ta/W composites were investigated by optical microscopy (OM),scanning electron microscopy (SEM) and tensile test.The results show that it is possible to prepare Ta/W composites with different W volume fractions by CVD,and the actual densities of the composites are more than 99.4% of the theoretical density.Both Ta and W layers have columnar grain structures,and the more close to the interface,the more fine the grains are.The mechanical properties of CVD Ta/W are better than those of CVD Ta or CVD W.After hot treatment(1600 ℃×2 h),the diffused layers of the composites have become more wider and the mechanical properties are increased remarkably,and the tensile strength of the CVD Ta/W composite with 18%W is 660 MPa.