| 电容并联式射频MEMS开关的制作工艺探讨 |
| |
| 作者姓名： | 王珊珊 王平 |
| |
| 作者单位： | 中国空间技术研究院西安分院,西安710000 |
| |
| 摘 要： | 文章对MEMS电容并联式射频开关的制作工艺进行了探讨，该射频开关采用双端固定的空气桥结构。通过实验，研究了精细共面波导图形的光刻工艺；采用正胶作为牺牲层，探讨了牺牲层的制作工艺，并分析了牺牲层释放方法对立体结构的影响。
|
| 关 键 词： | RF—MEMS 开关 光刻 牺牲层 |
Study of Fabrication Technology of RF MEMS in Parallel |
| |
| Authors: | Wang Shanshan Wang Ping |
| |
| Institution: | Wang Shanshan Wang Ping (China Academy of space Technology(Xi＇an) ,Xi＇an 710000, China) |
| |
| Abstract: | Fabrication technology of RF MEMS switch in parallel connection is discussed in this paper. The double-end fixed bridge structure is used in this switch. The fine lithograph process of co-planar wave-guide figure is discussed through experimets. Finally, the growth of the positive pastern sacrificial layer and its released method affect the performance of switches are also discussed. |
| |
| Keywords: | RF-MEMS Switches Lithograph Sacrificial layer |
| 本文献已被 维普 等数据库收录！ |
