| 散粒磨粒抛光运动轨迹的仿真与合理参数的选择 |
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| 引用本文： | 史兴宽,仝猛,袁昕,任敬心.散粒磨粒抛光运动轨迹的仿真与合理参数的选择[J].航空精密制造技术,1998(3). |
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| 作者姓名： | 史兴宽 仝猛 袁昕 任敬心 |
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| 作者单位： | 西北工业大学飞行器制造工程系 |
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| 摘 要： | 通过计算机模拟出磨粒的运动轨迹，从而得出影响抛光质量的因素，并提出了合理的抛光运动参数。
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| 关 键 词： | 散粒磨粒抛光 轨迹仿真 抛光作用力 |
Simulation of Machining Trace and Alternation of Proposed Parameters in the Lose Abrasive Polishing * |
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| Shi Xingkuan,Tong Meng,Yuan Xin et al.Simulation of Machining Trace and Alternation of Proposed Parameters in the Lose Abrasive Polishing *[J].Aviation Precision Manufacturing Technology,1998(3). |
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| Authors: | Shi Xingkuan Tong Meng Yuan Xin [ |
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| Abstract: | In this paper, abrasive machining trace has been simulated by computer in which we have obtained the factors influencing on polished surface quality of parts, and proposed optimium polishing parameters. |
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| Keywords: | lose abrasive polishing simulation of machining trace polishing pressure |
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