赝火花脉冲电子束烧蚀制备纳米薄膜

类似于脉冲激光束烧蚀法制备薄膜 ,利用纳秒赝火花脉冲电子束与靶材料相互作用 ,通过靶材料的瞬间熔化、蒸发或以团簇抛出的方式 ,在低温衬底上重新成核、凝结 ,得到了与靶材的化学计量比相同的薄膜。讨论了材料烧蚀和沉积过程中出现的诸多现象 ,并给出高分辨电子显微镜、X射线衍射、光电子能谱分析等方法的测试结果。研究表明 ,由于赝火花脉冲电子束高功率密度 (10 9W cm2 )的瞬态烧蚀作用 ,为研究和制备多元素氧化物薄膜、难熔金属多层膜或氧化物 金属多层膜提供了一种新手段

Preparation of nanometer thin films by nanosecond pseudospark beam ablation

Similar to film deposition of laser beam ablation the pseudospark electron beams with nanosecond duration can be used for film preparation through the interaction of beam and target to cause rapid melting, vaporization and explosion of clusters of target materials and nucleation crystallization of ablated target cluster with similar ratio of components occur on the surface of substrates. Physical processes of the ablation and deposition of this new technology have been investigated. Experimental results show that a variety of multilayered films with the oxides of multiple elements, and metals/oxides layered films can be deposited by using the new approach of pseudospark electron beam ablation. The observation of high resolution electron microscopy, X ray diffraction, photo electronic energy spectroscopy have been presented. Experimental results show that such a new approach of film deposition with made application possess some unique advantages.