释放SF6气体扰动电离层时的人工气辉研究

在电离层高度释放SF₆气体能够显著扰动电离层.根据SF₆分子在电离层中的扩散方程,同时考虑其在电离层中主要的离子化学反应,研究了SF₆气体释放后电离层各粒子浓度的时空变化,计算了产生人工气辉的体发射系数和发射强度.结果表明,SF₆气体在电离层高度释放后,电子和O⁺的密度均有大幅度下降,主要的负离子成分由电子转变成SF₅^-;在释放过程中,主要产生777.4 nm和135.6 nm两种气辉,且前者的气辉强度远小于后者;电离层温度对气辉的强度有很大的影响.本文的数值计算与美国IMS/SF₆实验观测数据进行比较,结果近似,且通过数据比较还能准确推断出实验时当地的电离层温度.

Research on Artificial Airglow During Ionospheric Modification by the Release of SF6 Gas

Release of a chemically reactive gas such as SF₆ into the ionosphere region can disturb its plasma environment.In this paper,in terms of diffusion equation of SF₆ gas and mainly ionchemistry reactions in ionosphere region,the density changes of ionospheric particles response to the release of SF₆ gas are investigated,and the airglow volume emission rates and intensity from the SF₆ gas released at ionospheric altitudes are calculated.The results show that the diffusion of released SF₆ gas in ionospheric is very quick,and these SF₆ gas molecules can cause a large scale depletion of ionospheric electron and O⁺ density,and the dominate negative ion of ionospheric region is converted into SF₅^-.During the releasing,the 777.4 nm and 135.6 nm airglows will be excited,the intensity of 777.4 nm is much weaker,and the ionospheric temperature may play an important role in the airglow intensity.Comparing the results of our calculations with American IMS/SF₆ experimental data,it shows good agreement,and the temperature of experiment local ionosphere can be exactly estimated through this comparison.