| 抛光参量对抛光光学元件亚表层的影响 |
| |
| 引用本文： | 王桃芬,张循利,时宝国.抛光参量对抛光光学元件亚表层的影响[J].航空精密制造技术,2008,44(1):25-27. |
| |
| 作者姓名： | 王桃芬 张循利 时宝国 |
| |
| 作者单位： | 1. 湖南科技大学物理学院,湘潭,411201
2. 滨州学院物理系,滨州,256600 |
| |
| 摘 要： | 研究了抛光粉的种类、抛光速度的大小以及抛光玻璃的性质等抛光参量对光学元件亚表层特征的影响,并结合抛光机理进行了分析。
|
| 关 键 词： | 抛光 亚表层缺陷 抛光粉 熔石英 抛光速度 |
| 文章编号： | 1003-5451(2008)01-0025-03 |
| 修稿时间： | 2007年9月25日 |
Influences of Polishing Parameters on Subsurface Damage of Polishing Components |
| |
| WANG Tao-fen,ZHANG Xun-li,SHI Bao-guo.Influences of Polishing Parameters on Subsurface Damage of Polishing Components[J].Aviation Precision Manufacturing Technology,2008,44(1):25-27. |
| |
| Authors: | WANG Tao-fen ZHANG Xun-li SHI Bao-guo |
| |
| Abstract: | The influence of the parameters during the polishing process such as the types of polishing powder, the polishing speed, the characters of the polishing glass, on the properties of the polished components has been studied, and the detailed analysis has been made based on the polishing theory. |
| |
| Keywords: | polishing subsurface damage polishing powder fused silica polishing speed |
| 本文献已被 CNKI 万方数据 等数据库收录！ |
|
