可见光迷彩低红外发射率薄膜制备及其特性

采用多弧离子镀技术,在Al基底上制备了TiO2/TiN多层膜。通过控制基底材料的粗糙度使制备出的薄膜在可见波段具有非镜面反射效果。采用扫描电镜、红外辐射率测量仪、紫外-可见-近红外光光度计等测试手段对薄膜样品进行了表征。结果表明,采用多弧离子镀法在Al基底上制备了结合力良好、具有迷彩效果的低红外发射率薄膜。研究发现,随氧化层厚度增加,薄膜发射率趋向稳定(0.2左右)。薄膜电阻随氧化层厚度的变化无明显变化。

Preparation and Characterization of Visible Camouflage FilmsWith Low Infrared Emissivity

The TiO2 / TiN films were grown by multiarc plasma deposition on Al substrates. Through controlling
the roughness of the substrate material, the prepared films possessed nonspecular reflection effect in visible band.The films were analyzed and characterized by scanning electron microscopy, infrared radiation measurement instrument and the UV visible spectrum. The results show that visible camouflage films with low infrared emission and good binding force can be grown by multi arc plasma deposition on Al substrate. The results show also that the infrared emission tends to be stabilized at a value of about 0. 2, as the thickness of the oxide layer increased.